Influence of substrate temperature and N 2 /Ar flow ratio on the stoichiometry, structure and hardness of TaNx coatings deposited by DC reactive sputtering

  • K. Valdez, D. G. Espinosa‐Arbeláez, J. E. García‐Herrera, J. Muñoz‐Saldaña, M. H. Farias, W. De la Cruz
  • Surface and Interface Analysis, September 2015, Wiley
  • DOI: 10.1002/sia.5808

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http://dx.doi.org/10.1002/sia.5808

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