On the “Growth” of Nano-Structures on c-Silicon via Self-Masked Plasma Etching Processes

  • On the “Growth” of Nano-Structures on c-Silicon
  • Rosa Di Mundo, Fabio Palumbo, Gianni Barucca, Gianfranco Sabato, Riccardo d'Agostino
  • Plasma Processes and Polymers, July 2013, Wiley
  • DOI: 10.1002/ppap.201300031

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http://dx.doi.org/10.1002/ppap.201300031

The following have contributed to this page: Rosa Di Mundo and PhD Gianni Barucca