Current affiliation: STMicroelectronicsSubject: Electrical EngineeringPrimary location: France
Published in:31st European Mask and Lithography ConferencePublication date:2015-09-04
Published in:Design-Process-Technology Co-optimization for Manufacturability XPublication date:2016-03-16
Published in:Optical Microlithography XXIXPublication date:2016-03-15
Published in:Alternative Lithographic Technologies VIIIPublication date:2016-03-22
Published in:2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)Publication date:2015-05-01
Published in:Metrology, Inspection, and Process Control for Microlithography XXXIPublication date:2017-03-28
SEM images provide valuable information about patterning capability. Geometrical properties such as Critical Dimension (CD) can be extracted from t...