All Stories

  1. Study of high speed etching of silicon in KOH + NH2OH Solution at lower temperatures for the fabrication of through holes in silicon wafer
  2. A systematic study of the etching characteristics of Si{111} in modified TMAH
  3. Dynamic analysis of microbeams based on modified strain gradient theory using differential quadrature method
  4. Effective improvement in the etching characteristics of Si{110} in Low concentration TMAH solution.
  5. Investigation of room temperature deposited silicon dioxide thin films for surface texturisation of monocrystalline {100} silicon
  6. Anisotropic etching in low-concentration KOH: effects of surfactant concentration
  7. Anisotropic etching on Si{1 1 0}: experiment and simulation for the formation of microstructures with convex corners
  8. A detailed investigation and explanation of the appearance of different undercut profiles in KOH and TMAH