All Stories

  1. Process-induced damage and its recovery for a CoFeB–MgO magnetic tunnel junction with perpendicular magnetic easy axis

    Article • Japanese Journal of Applied Physics, September 2014, Japan Society of Applied Physics

    Dr Keizo Kinoshita, Dr. Hiroaki Honjo

  2. Plasma process induced physical damages on multilayered magnetic films for magnetic domain wall motion

    Article • Japanese Journal of Applied Physics, January 2014, Institute of Physics Publishing

    Dr Keizo Kinoshita, Dr. Hiroaki Honjo

  3. Nonvolatile logic-in-memory array processor in 90nm MTJ/MOS achieving 75% leakage reduction using cycle-based power gating

    Article • February 2013, Institute of Electrical & Electronics Engineers (IEEE)

    Dr Keizo Kinoshita

  4. Damage Recovery by Reductive Chemistry after Methanol-Based Plasma Etch to Fabricate Magnetic Tunnel Junctions

    Article • Japanese Journal of Applied Physics, August 2012, Japan Society of Applied Physics

    Dr Keizo Kinoshita, Dr. Hiroaki Honjo

  5. Damage Recovery by Reductive Chemistry after Methanol-Based Plasma Etch to Fabricate Magnetic Tunnel Junctions

    Article • Japanese Journal of Applied Physics, August 2012, Japan Society of Applied Physics

    Dr Keizo Kinoshita, Dr. Hiroaki Honjo

  6. Effect of O - Ion Beam Irradiation during RF-Magnetron Sputtering on Characteristics of CoFeB–MgO Magnetic Tunnel Junctions

    Article • Japanese Journal of Applied Physics, February 2011, Japan Society of Applied Physics

    Dr Keizo Kinoshita

  7. Effect of O - Ion Beam Irradiation during RF-Magnetron Sputtering on Characteristics of CoFeB–MgO Magnetic Tunnel Junctions

    Article • Japanese Journal of Applied Physics, February 2011, Japan Society of Applied Physics

    Dr Keizo Kinoshita

  8. Etching Magnetic Tunnel Junction with Metal Etchers

    Article • Japanese Journal of Applied Physics, August 2010, Japan Society of Applied Physics

    Dr Keizo Kinoshita

  9. Ultralow-k/Cu Damascene Multilevel Interconnects Using High Porosity and High Modulus Self-Assembled Porous Silica

    Article • Journal of The Electrochemical Society, January 2010, The Electrochemical Society

    Dr Keizo Kinoshita

  10. Spatial Variation of Negative Oxygen Ion Energy Distribution in RF Magnetron Plasma with Oxide Target

    Article • Japanese Journal of Applied Physics, November 2009, Japan Society of Applied Physics

    Dr Keizo Kinoshita

  11. Fine Structure of O-Kinetic Energy Distribution in RF Plasma and Its Formation Mechanism

    Article • Applied Physics Express, November 2009, Institute of Physics Publishing

    Dr Keizo Kinoshita

  12. Integration of Self-Assembled Porous Silica in Low- k /Cu Damascene Interconnects

    Article • Japanese Journal of Applied Physics, September 2009, Japan Society of Applied Physics

    Dr Keizo Kinoshita

  13. Via-Shape-Control for Copper Dual-Damascene Interconnects With Low-k Organic Film

    Article • IEEE Transactions on Semiconductor Manufacturing, May 2008, Institute of Electrical & Electronics Engineers (IEEE)

    Dr Keizo Kinoshita

  14. Plasma-Enhanced Co-Polymerization of Organo-siloxane and Hydrocarbon for Low- k /Cu Interconnects

    Article • Japanese Journal of Applied Physics, July 2007, Japan Society of Applied Physics

    Dr Keizo Kinoshita

  15. An Organic Low-k Film Deposited by Plasma-Enhanced Copolymerization

    Article • Journal of The Electrochemical Society, January 2007, The Electrochemical Society

    Dr Keizo Kinoshita

  16. Effect of Bridging Groups of Precursors on Modulus Improvement in Plasma-Enhanced Copolymerized Low-k Films

    Article • Journal of The Electrochemical Society, January 2007, The Electrochemical Society

    Dr Keizo Kinoshita

  17. A Cu Electroplating Solution for Porous Low-k∕Cu Damascene Interconnects

    Article • Journal of The Electrochemical Society, January 2007, The Electrochemical Society

    Dr Keizo Kinoshita

  18. Plasma Etch Rates of Porous Silica Low- k Films with Different Dielectric Constants

    Article • Japanese Journal of Applied Physics, November 2006, Japan Society of Applied Physics

    Dr Keizo Kinoshita

  19. Recovery from Plasma-Process-Induced Damage in Porous Silica Low- k Films by Organosiloxane Vapor Annealing

    Article • Japanese Journal of Applied Physics, August 2006, Japan Society of Applied Physics

    Dr Keizo Kinoshita

  20. Vapor phase reactions in polymerization plasma for divinylsiloxane-bis-benzocyclobutene film deposition

    Article • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, January 2006, American Vacuum Society

    Dr Keizo Kinoshita

  21. Influence of Cu Electroplating Solution on Self-Assembled Porous Silica Low-k Films

    Article • Journal of The Electrochemical Society, January 2006, The Electrochemical Society

    Dr Keizo Kinoshita

  22. Investigation of ion transportation in high-aspect-ratio holes from fluorocarbon plasma for SiO2 etching

    Article • Thin Solid Films, October 2000, Elsevier

    Dr Keizo Kinoshita

  23. Volume/surface effects on electron energy and dissociation reactions in large-volume plasma reactors

    Article • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, January 1999, American Vacuum Society

    Dr Keizo Kinoshita

  24. Translational Temperature Measurement for SiH 2 in RF Silane Plasma Using CW Laser Induced Fluorescence Spectroscopy

    Article • Japanese Journal of Applied Physics, August 1998, Japan Society of Applied Physics

    Dr Keizo Kinoshita

  25. Monitoring of Electron Energy Distribution Change from Optical Emission for Nonmagnetic Ultrahigh-Frequency Plasma

    Article • Japanese Journal of Applied Physics, April 1998, Japan Society of Applied Physics

    Dr Keizo Kinoshita

  26. Thermal desorption spectroscopy study of HF/DF-treated Si(100) surfaces

    Article • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, November 1995, American Vacuum Society

    Dr Keizo Kinoshita

  27. Reactive ion etching of Fe-Si-Al alloy for thin film head

    Article • IEEE Transactions on Magnetics, January 1991, Institute of Electrical & Electronics Engineers (IEEE)

    Dr Keizo Kinoshita