All Stories

  1. Printability of defects in Talbot lithography

    Article • Microelectronic Engineering, August 2015, Elsevier

    Takashi Sato

  2. Focus tolerance influenced by source size in Talbot lithography

    Article • Advanced Optical Technologies, January 2015, De Gruyter

    Takashi Sato

  3. Focus position and depth of two-dimensional patterning by Talbot effect lithography

    Article • Microelectronic Engineering, July 2014, Elsevier

    Takashi Sato

  4. Talbot effect immersion lithography by self-imaging of very fine grating patterns

    Article • Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, November 2012, American Vacuum Society

    Takashi Sato

  5. High-Order Approximation of the Talbot Distance for Lithography

    Article • Applied Physics Express, September 2012, Institute of Physics Publishing

    Takashi Sato

  6. Skewness and Kurtosis Risks of Quality Control in Overlay Inspection

    Article • Japanese Journal of Applied Physics, June 2010, Japan Society of Applied Physics

    Takashi Sato

  7. Effective-exposure-dose monitoring technique in EUV lithography

    Article • April 2010, SPIE

    Takashi Sato

  8. Focus Monitor Using Asymmetric Diffraction Rays by Off-Axis Monopole Illumination

    Article • Japanese Journal of Applied Physics, June 2009, Japan Society of Applied Physics

    Takashi Sato

  9. Mask-induced aberration in EUV lithography

    Article • April 2009, SPIE

    Takashi Sato

  10. Organized DFM

    Article • April 2009, SPIE

    Takashi Sato

  11. Dependence of mask topography effects on pattern variation under hyper-NA lithography

    Article • May 2008, SPIE

    Takashi Sato

  12. Prediction of imaging performance of immersion lithography using high refractive index fluid

    Article • March 2008, SPIE

    Takashi Sato

  13. Influence of pellicle on hyper-NA imaging

    Article • March 2008, SPIE

    Takashi Sato

  14. Aberration budget in extreme ultraviolet lithography

    Article • March 2008, SPIE

    Takashi Sato

  15. Mask topography effects of hole patterns on hyper-NA lithography

    Article • May 2007, SPIE

    Takashi Sato

  16. Virtual lithography system to improve the productivity of high-mix low-volume production

    Article • May 2007, SPIE

    Takashi Sato

  17. Mask 3D effect on 45-nm imaging using attenuated PSM

    Article • March 2007, SPIE

    Takashi Sato

  18. Impact of polarization on an attenuated phase shift mask with ArF hyper-numerical aperture lithography

    Article • Journal of Micro/Nanolithography MEMS and MOEMS, October 2006, SPIE

    Takashi Sato

  19. Characterization of 45 nm Attenuated Phase Shift Mask Lithography with a Hyper Numerical Aperture ArF Tool

    Article • Japanese Journal of Applied Physics, June 2006, Japan Society of Applied Physics

    Takashi Sato

  20. Hp45 lithography in consideration of the mask 3D effect

    Article • May 2006, SPIE

    Takashi Sato

  21. Impact of polarization for an attenuated phase-shift mask with ArF hyper-NA lithography

    Article • May 2005, SPIE

    Takashi Sato

  22. Alignment mark signal simulation system for the optimum mark feature selection

    Article • Journal of Micro/Nanolithography MEMS and MOEMS, April 2005, SPIE

    Takashi Sato

  23. Characterization of 45 nm att-PSM lithography with a hyper-NA ArF tool

    Article • January 2005, Institute of Electrical & Electronics Engineers (IEEE)

    Takashi Sato

  24. Development of an accurate empirical model for ArF lithography

    Article • May 2004, SPIE

    Takashi Sato

  25. KrF Excimer Laser Projection Lithography: 0.35µm Minimum Space VLSI Pattern Fabrication by a Tri-Level Resist Process

    Article • Japanese Journal of Applied Physics, February 1988, Japan Society of Applied Physics

    Takashi Sato

  26. Submicron Optical Lithography Using A KrF Excimer Laser Projection Exposure System

    Article • June 1987, SPIE

    Takashi Sato