All Stories

  1. Ideal phonon-scattering-limited mobility in inversion channels of 4H-SiC(0001) MOSFETs with ultralow net doping concentrations
  2. Anomalous carbon clusters in 4H-SiC/SiO2 interfaces
  3. Dynamic Characterization of the Threshold Voltage Instability under the Pulsed Gate Bias Stress in 4H-SiC MOSFET
  4. Photoluminescence of 10H-SiC
  5. h-yano@ms.naist.jp
  6. Low-temperature photoluminescence of 8H-SiC homoepitaxial layer
  7. Investigation of crystallinity and planar defects in the Si nanowires grown by vapor–liquid–solid mode using indium catalyst for solar cell applications
  8. Threshold Voltage Instability in 4H-SiC MOSFETs With Phosphorus-Doped and Nitrided Gate Oxides
  9. Crystallographic Structure of 8H- and 10H-SiC Analyzed by Raman Spectroscopy and Diffraction Methods
  10. ゲート酸化膜へのリン導入によるSiC-MOS界面欠陥の低減とMOSFETの高性能化
  11. POCl3 Annealing as a New Method for Improving 4H-SiC MOS Device Performance
  12. Photoluminescence of 8H-SiC
  13. Characterization of POCl3-Annealed 4H-Sic Mosfets by Charge Pumping Technique
  14. Comparison of Etch Pit Shapes on Off-Oriented 4H-SiC Using Different Halogen Gases
  15. Effect of Interfacial Localization of Phosphorus on Electrical Properties and Reliability of 4H-SiC MOS Devices
  16. Improved Stability of 4H-SiC MOS Device Properties by Combination of NO and POCl3 Annealing
  17. Origin of Anisotropic Electrical Properties of 4H-SiC Trench Metal–Oxide–Semiconductor Field-Effect Transistors on Off-Axis Substrates
  18. Origin of Anisotropic Electrical Properties of 4H-SiC Trench Metal–Oxide–Semiconductor Field-Effect Transistors on Off-Axis Substrates
  19. Single Etch-Pit Shape on Off-Angled 4H-SiC(0001) Si-Face Formed by Chlorine Trifluoride
  20. Single Etch-Pit Shape on Off-Angled 4H-SiC(0001) Si-Face Formed by Chlorine Trifluoride
  21. Development of 4H-SiC MOSFETs with Phosphorus-Doped Gate Oxide
  22. Curious Relationship between Orientation of SiC Substrates and Chemical Reactivity
  23. Clearance of 4H-SiC Sub-Trench in Hot Chlorine Treatment
  24. Effect of POCl3 Annealing on Reliability of Thermal Oxides Grown on 4H-SiC
  25. Shape Control of Trenched 4H-SiC C-Face by Thermal Chlorine Etching
  26. Shape Control of Trenched 4H-SiC C-Face by Thermal Chlorine Etching
  27. Shallow Traps at P-Doped SiO2/4H-SiC(0001) Interface
  28. Surface Treatments of 4H-SiC Evaluated by Contact Angle Measurement
  29. Improved MOS Interface Properties of C-Face 4H-SiC by POCl3 Annealing
  30. Control of Inclined Sidewall Angles of 4H-SiC Mesa and Trench Structures
  31. Instability of 4H-SiC MOSFET Characteristics due to Interface Traps with Long Time Constants
  32. Extraordinary Characteristics of 4H-SiC Trench MOSFETs on Large Off-Axis Substrates
  33. Photoconductivity in inverse silicon opals enhanced by slow photon effect: Yet another step towards optically amplified silicon photonic crystal solar cells
  34. Improved Inversion Channel Mobility in 4H-SiC MOSFETs on Si Face Utilizing Phosphorus-Doped Gate Oxide
  35. Classification of defects in polycrystalline Si by temperature dependence of Electroluminescence under forward and reverse-biases
  36. Removal of near-interface traps at SiO2/4H–SiC (0001) interfaces by phosphorus incorporation
  37. Systematic Investigation of Interface Properties in 4H-SiC MOS Structures Prepared by Over-Oxidation of Ion-Implanted Substrates
  38. Investigation of Oxide Films Prepared by Direct Oxidation of C-Face 4H-SiC in Nitric Oxide
  39. Hexagonality and Stacking Sequence Dependence of Etching Properties in Cl2-O2-SiC System
  40. Self-Formation of Specific Pyramidal Planes in 4H-SiC Formed by Chlorine Based Ambience
  41. Significant Decrease of the Interface State Density by NH3 Plasma Pretreatment at 4H-SiC (000-1) Surface and its Bond Configuration
  42. NH3Plasma Pretreatment of 4H-SiC(000\bar1) Surface for Reduction of Interface States in Metal–Oxide–Semiconductor Devices
  43. Improved Inversion Channel Mobility in Si-face 4H-SiC MOSFETs by Phosphorus Incorporation Technique
  44. Improvement of Interface Properties by NH3 Pretreatment for 4H-SiC(000-1) MOS Structure
  45. Interface Properties of C-face 4H-SiC Metal-Oxide-Semiconductor Structures Prepared by Direct Oxidation in Nitric Oxide
  46. Comprehensive study of electroluminescence in multicrystalline silicon solar cells
  47. Thermal Etching of 4H-SiC(0001) Si Faces in the Mixed Gas of Chlorine and Oxygen
  48. Investigation of Near-Interface Traps Generated by NO Direct Oxidation in C-face 4H-SiC Metal–Oxide–Semiconductor Structures
  49. Nonvolatile Thin Film Transistor Memory with Ferritin
  50. Anisotropic Etching of SiC in the Mixed Gas of Chlorine and Oxygen
  51. Criteria for Accurate Measurement of Charge-Pumping Current in 4H-SiC MOSFETs
  52. Threshold Voltage Shift in Ga2O3-In2O3-ZnO (GIZO) Thin Film Transistors under Constant Voltage Stress
  53. Thermal Analysis of Degradation in Ga 2 O 3 –In 2 O 3 –ZnO Thin-Film Transistors
  54. Analysis of Anomalous Charge-Pumping Characteristics on 4H-SiC MOSFETs
  55. Crystallinity Evaluation by Microwave Photoconductivity Decay in Double-Layered Polycrystalline Silicon Thin Films Crystallized by Solid Green Laser Annealing
  56. Polycrystalline silicon thin-film transistors on quartz fiber
  57. Increased Channel Mobility in 4H-SiC UMOSFETs Using On-Axis Substrates
  58. Properties of Thermally Etched 4H-SiC by Chlorine-Oxygen System
  59. Modification of SiO2/4H-SiC Interface Properties by High-Pressure H2O Vapor Annealing
  60. Sloped Sidewalls in 4H-SiC Mesa Structure Formed by a Cl2-O2 Thermal Etching
  61. Low-temperature Polycrystalline Silicon Thin Film Transistor Flash Memory with Ferritin
  62. Low Temperature Polycrystalline Silicon Thin Film Transistors Flash Memory with Silicon Nanocrystal Dot
  63. Reliability of Low Temperature Polycrystalline Silicon Thin-Film Transistors with Ultrathin Gate Oxide
  64. Crystallization of Double-Layered Silicon Thin Films by Solid Green Laser Annealing for High-Performance Thin-Film Transistors
  65. Reliability Analysis of Ultra Low-Temperature Polycrystalline Silicon Thin-Film Transistors
  66. Crystallization of Double-Layered Silicon Thin Films by Solid Green Laser Annealing
  67. Anomalously anisotropic channel mobility on trench sidewalls in 4H-SiC trench-gate metal-oxide-semiconductor field-effect transistors fabricated on 8° off substrates
  68. Properties of Thermally Etched 4H-SiC by Chlorine-Oxygen System
  69. Modification of SiO2/4H-SiC Interface Properties by High-Pressure H2O Vapor Annealing
  70. Sloped Sidewalls in 4H-SiC Mesa Structure Formed by a Cl2-O2 Thermal Etching
  71. Increased Channel Mobility in 4H-SiC UMOSFETs Using On-Axis Substrates
  72. Characterization of 4H-SiC MOSFETs with NO-Annealed CVD Oxide
  73. Characterization of 4H-SiC MOSFETs Formed on the Different Trench Sidewalls
  74. 3-Dimensional Non-Destructive Dislocation Analyses in SiC Measured by Planar Electron-Beam-Induced Current Method
  75. High Purity SiC Epitaxial Growth by Chemical Vapor Deposition Using CH3SiH3 and C3H8 Sources
  76. Evaluation of Crystallinity in 4H-SiC{0001} Epilayers Thermally Etched by Chlorine and Oxygen System
  77. Improvement of Reliability in Low-Temperature Polycrystalline Silicon Thin-Film Transistors by Water Vapor Annealing
  78. Characterization of 4H-SiC MOSFETs with NO-Annealed CVD Oxide
  79. 3-Dimensional Non-Destructive Dislocation Analyses in SiC Measured by Planar Electron-Beam-Induced Current Method
  80. Characterization of 4H-SiC MOSFETs Formed on the Different Trench Sidewalls
  81. Crystallization of Double-Layered Silicon Thin Films by Solid Green Laser Annealing and Its Application to Low Temperature poly-Si Thin Film Transistors
  82. High Purity SiC Epitaxial Growth by Chemical Vapor Deposition Using CH3SiH3 and C3H8 Sources
  83. Analysis of minority carrier diffusion length in SiC toward high quality epitaxial growth
  84. Floating Nanodot Gate Memory Devices Based on Biomineralized Inorganic Nanodot Array as a Storage Node
  85. Analysis of Photoelectrochemical Processes in α-SiC Substrates with Atomically Flat Surfaces
  86. Nondestructive Analysis of Crystal Defects in 4H-SiC Epilayer by Devised Electron-Beam-Induced Current Method
  87. Thermal degradation of low temperature poly-Si TFT
  88. Electron Injection into Si Nanodot Fabricated by Side-Wall Plasma Enhanced Chemical Vapor Deposition
  89. Role of Hydrogen in Dry Etching of Silicon Carbide Using Inductively and Capacitively Coupled Plasma
  90. Fabrication of Anodic Oxidation Films on 4H–SiC at Room Temperature Using HNO 3 -Based Electrolytes
  91. High Temperature NO Annealing of Deposited SiO2 and SiON Films on N-Type 4H-SiC
  92. Reduction of Fluoride Species and Surface Roughness by H2 Gas Addition in SiC Dry Etching
  93. Degradation in Low-Temperature Poly-Si Thin Film Transistors Depending on Grain Boundaries
  94. High Temperature NO Annealing of Deposited SiO2 and SiON Films on N-Type 4H-SiC
  95. Reduction of Fluoride Species and Surface Roughness by H2 Gas Addition in SiC Dry Etching
  96. Mechanisms in Electrochemical Etching of α-SiC Substrates
  97. Relationship between Surface Structures and Aluminium Incorporation Behaviour of SiC in Chemical Vapor Deposition
  98. Influence of H2 Pre-Treatment on Ni/4H-SiC Schottky Diode Properties
  99. Radical Nitridation of Ultra-Thin SiO2/SiC Structure
  100. Fast Oxidation of 4H-SiC at Room Temperature by Electrochemical Methods
  101. Hot Carrier Analysis in Low-TemperaturePoly-Si TFTs Using Picosecond Emission Microscope
  102. Epitaxial Growth and Device Processing of SiC on Non-Basal Planes
  103. Improvement of SiO 2 /SiC Interface Properties by Nitrogen Radical Irradiation
  104. Hot carrier analysis in low-temperature poly-Si thin-film transistors using pico-second time-resolved emission microscope
  105. Low Temperature Nitridation of Si Oxide Utilizing Activated Oxygen and Nitrogen
  106. Hot Carrier Effect in Low-Temperature Poly-Silicon p-Channel Thin-Film Transistors
  107. Reliability of Low-Temperature Poly-Si Thin-Film Transistors
  108. Surface Structure of Electrochemically Etched α-SiC Substrates
  109. Effects of Nitrogen Radical Irradiation on Performance of SiC MOSFETs
  110. Interface properties in metal-oxide-semiconductor structures on n-type 4H-SiC(033̄8)
  111. Gate Length Dependence of Hot Carrier Reliability in Low-Temperature Polycrystalline-Silicon P-Channel Thin Film Transistors
  112. Shallow states at SiO2/4H-SiC interface on (112̄0) and (0001) faces
  113. Low Temperature Nitridation of Si Oxide Utilizing Activated Nitrogen
  114. Comprehensive Study on Reliability of Low-Temperature Poly-Si Thin-Film Transistors under Dynamic Complimentary Metal-Oxide Semiconductor Operations
  115. Hot Carrier Effect in Low-Temperature poly-Si p-ch Thin-Film Transistors under Dynamic Stress
  116. Improvement of SiO2/α-SiC Interface Properties by Nitrogen Radical Treatment
  117. 4H-SiC MOSFETs on (03-38) Face
  118. SiO2/SiC Interface Properties on Various Surface Orientations
  119. 4H- and 6H-SiC MOSFETs Fabricated on Sloped Sidewalls Formed by Molten KOH Etching
  120. Chemical vapor deposition and deep level analyses of 4H-SiC(112̄0)
  121. A cause for highly improved channel mobility of 4H-SiC metal–oxide–semiconductor field-effect transistors on the (112̄0) face
  122. Comprehensive Study on Reliability of Low-Temperature Poly-Si TFTs under Dynamic CMOS Operations
  123. Recent Progress in SiC Epitaxial Growth and Device Processing Technology
  124. Interface States of SiO2/SiC on (11-20) and (0001) Si Faces
  125. High Channel Mobility in Inversion Layer of SiC MOSFETs for Power Switching Transistors
  126. 4H-SiC (11-20) Epitaxial Growth
  127. Traps at the SiC/SiO2-Interface
  128. Epitaxial Growth of SiC on Non-Typical Orientations and MOS Interfaces
  129. Anisotropy of Inversion Channel Mobility in 4H- and 6H-SiC MOSFETs on (11-20) Face
  130. MOSFET Performance of 4H-, 6H-, and 15R-SiC Processed by Dry and Wet Oxidation
  131. SiC MISFETs with MBE-grown AlN Gate Dielectric
  132. Recent Progress in SiC Ion Implantation and MOS Technologies for High Power Devices
  133. High channel mobility in inversion layers of 4H-SiC MOSFETs by utilizing (112~0) face
  134. Effects of wet oxidation/anneal on interface properties of thermally oxidized SiO/sub 2//SiC MOS system and MOSFET's
  135. High Channel Mobility in Inversion Layer of SiC MOSFETs for Power Switching Transistors
  136. Deep States in SiO2/p-Type 4H-SiC Interface
  137. Deep Interface States in SiO 2/p-type α-SiC Structure
  138. Plasma nitridation of gate insulator on 4H-SiC
  139. Reliability analysis of low temperature poly-si thin film transistors by high spatial resolution thermography
  140. New evaluation method for reliability of poly-Si thin film transistors using pico-second time-resolved emission microscope
  141. Low temperature nitridation of PLCVD HfSixOy gate dielectrics using nitrogen radicals
  142. Analysis of reliability in low-temperature poly-Si thin film transistors using pico-second time-resolved emission microscope