All Stories

  1. Accurate blood diagnostic using Ion Beam Analysis on blood drops
  2. Lasting Non-toxic Anti-fog
  3. How to measure molecules on Si surfaces and their effect of surface tension.
  4. Ion Beam Analysis Of Silicon-Based Surfaces And Correlation With Surface Energy Measurements
  5. A New 3D Multistring Code to Identify Compound Oxide Nanophase With Ion Channeling
  6. Atomic displacement free interfaces and atomic registry in SiO2∕(1×1) Si(100)
  7. Infrared spectroscopic analysis of an ordered Si/SiO2 interface
  8. The formation of ordered, ultrathin SiO2/Si(100) interfaces grown on (1×1) Si(100)
  9. Long Range Order in Ultra-Thin SiO2 Grown on Ordered Si(100)
  10. H-passivation of Si(100) By Wet Chemical Cleaning: Discovery of Ordering
  11. Discovery of Long Range Order in Thin (2-20 NM) SiO2 Films by Ion Beam Analysis
  12. Heteroepitaxial properties of Si1−x−yGexCy on Si(100) grown by combined ion- and molecular-beam deposition
  13. Microstructure and ion beam characterization of heteroepitaxial Si1−x−yGexCy
  14. Characterization of carbon in heteroepitaxial Si1 − x − yGexCy thin films via combined ion channeling and nuclear resonance analysis
  15. The onset of secondary phase precipitation during synthesis of heteroepitaxial Si1−x−yGexCy on Si(100)
  16. Damage-to-dose ratio after low energy silicon ion implantation into crystalline silicon
  17. Microstructure and stoichiometry dependence of ion beam nitrides as a function of energy and temperature: A comparative study between Si and SiGe
  18. Kinetics of ion beam nitridation (IBN) of Si and of MBE-grown Ge and SixGe1−x alloys: The role of ion energy, ion dose and substrate temperature
  19. Thin film formation from low energy ions: new kinetic paths, new properties, new phases
  20. Damage to Crystalline Silicon Following Implantation by Low Energy Silicon Ions
  21. Structure and properties of silicon nitride and nitride prepared by direct low energy ion beam nitridation
  22. Comparative study of low energy ion beam oxidation of Si(100), Ge/Si(100) and
  23. New SiGe dielectrics grown at room temperature by low‐energy ion beam oxidation and nitridation
  24. Epitaxy and Chemical Reactions During Thin Film Formation from Low Energy Ions New Kinetic Pathways, New Phases and New Properties
  25. Epitaxy and Chemical Reactions During Thin Film Formation from Low Energy Ions New Kinetic Pathways, New Phases and New Properties
  26. Role of point defect diffusion and recombination in low-temperature growth of semiconductor heterostructures using low-energy ion beams
  27. The role of interfacial segregation and microstructure in interdiffusion between aluminum and silicon
  28. Ion beam deposition in materials research
  29. A Model for Interdiffusion at Metal Semiconductor Interfaces: Conditions for Spiking
  30. Integrated Processinyg of Silicided Shallow Junctions using Rapid Thermal Annealing Prior to Dopant Activation
  31. Silicided Shallow Junction Formation Using Ion Implantation and Thermal Annealing
  32. Semiconductor-based heterostructure formation using low energy ion beams: Ion beam deposition (IBD) & combined ion and molecular beam deposition (CIMD)
  33. Low-temperature epitaxial growth of Si and Ge and fabrication of isotopic heterostructures by direct ion beam deposition
  34. Ion-solid interactions during ion beam deposition of 74Ge and 30Si on Si at very low ion energies (0–200 eV range)
  35. Investigations of Low-Temperature Epitaxy, Ion Damage, and Reactive-Ion Cleaning Utilizing Ion Beam Deposition
  36. Investigations of Low-Temperature Epitaxy, Ion Damage, and Reactive-Ion Cleaning Utilizing Ion Beam Deposition
  37. RBS study of the effect of arsenic and phosphorus interfacial segregation upon the sintering of contacts between implanted polycrystalline silicon and aluminum: Silicon(1%)
  38. Ion Beam Deposition of Materials At 40–200 Ev: Effect of Ion Energy And Substrate Temperature On Interface, Thin Film And Damage Formation
  39. Arsenic Dopant Influence upon the Sintering Behavior of the Aluminum-Polysilicon Interface
  40. Surface Characterization of Arsenic Implanted Silicon (100): A New Insight into the Inhibition of Aluminum/Silicon Interdiffusion
  41. Interface Failure of Gold Covered SiO2 Substrate With TiW and Nb Intermediate Adhesion Layers