All Stories

  1. Performance of 250W high-power HVM LPP-EUV source

    Article • March 2017, SPIE

    Mr Taku Yamazaki

  2. Development of 250W EUV light source for HVM lithography

    Article • March 2017, Institute of Electrical & Electronics Engineers (IEEE)

    Mr Taku Yamazaki

  3. Development of 250W EUV light source for HVM lithography

    Article • February 2017, SPIE

    Mr Taku Yamazaki

  4. 100W EUV light-source key component technology update for HVM

    Article • March 2016, SPIE

    Mr Taku Yamazaki

  5. Performance of new high-power HVM LPP-EUV source

    Article • March 2016, SPIE

    Mr Taku Yamazaki

  6. Development of 250W EUV light source for HVM lithography

    Article • March 2016, Institute of Electrical & Electronics Engineers (IEEE)

    Mr Taku Yamazaki

  7. Performance of one hundred watt HVM LPP-EUV source

    Article • March 2015, SPIE

    Mr Taku Yamazaki

  8. Key components technology update of 100W HVM EUV source

    Article • March 2015, SPIE

    Mr Taku Yamazaki

  9. Performance of 100-W HVM LPP-EUV source

    Article • Advanced Optical Technologies, January 2015, De Gruyter

    Mr Taku Yamazaki

  10. Sub-hundred Watt operation demonstration of HVM LPP-EUV source

    Article • April 2014, SPIE

    Mr Taku Yamazaki

  11. LPP-EUV light source development for high volume manufacturing lithography

    Article • April 2013, SPIE

    Mr Taku Yamazaki

  12. Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography

    Article • March 2012, SPIE

    Mr Taku Yamazaki

  13. High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography

    Article • March 2008, SPIE

    Mr Taku Yamazaki

  14. Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography

    Article • March 2007, SPIE

    Mr Taku Yamazaki

  15. GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography

    Article • March 2006, SPIE

    Mr Taku Yamazaki

  16. Development of high-power ArF/F 2 laser platform for VUV microlithography

    Article • May 2004, SPIE

    Mr Taku Yamazaki

  17. Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

    Article • June 2003, SPIE

    Mr Taku Yamazaki

  18. Model-based SAR ATR system

    Article • June 1996, SPIE

    Mr Taku Yamazaki

  19. Seawater hydraulic actuator system for underwater manipulator

    Article • January 1991, Institute of Electrical & Electronics Engineers (IEEE)

    Mr Taku Yamazaki

  20. Development of coupled tendon-driven multijoint manipulator

    Article • Institute of Electrical & Electronics Engineers (IEEE)

    Mr Taku Yamazaki