All Stories

  1. Cooperation between adsorbates accounts for the activation of atomic layer deposition reactions

    Article • Nanoscale, January 2015, Royal Society of Chemistry

    Simon Elliott

  2. Quantum chemical and solution phase evaluation of metallocenes as reducing agents for the prospective atomic layer deposition of copper

    Article • Dalton Transactions, January 2015, Royal Society of Chemistry

    Simon Elliott

  3. Reduction mechanisms of the CuO(111) surface through surface oxygen vacancy formation and hydrogen adsorption

    Article • Physical Chemistry Chemical Physics, January 2014, Royal Society of Chemistry

    Simon Elliott

  4. Structural and energetic origin of defects at the interface between germanium and a high-k dielectric from first principles

    Article • Applied Physics Letters, February 2011, American Institute of Physics

    Simon Elliott, Jim Greer