All Stories

  1. Defect-free fabrication of nano-disk and nano-wire by fusion of bio-template and neutral beam etching

    Article • November 2016, SPIE

    Shuichi Noda

  2. Defect-free germanium etching for 3D Fin MOSFET using neutral beam etching

    Article • August 2016, Institute of Electrical & Electronics Engineers (IEEE)

    Shuichi Noda

  3. Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess

    Article • August 2016, Institute of Electrical & Electronics Engineers (IEEE)

    Shuichi Noda

  4. Fabrication of FinFETs by Damage-Free Neutral-Beam Etching Technology

    Article • IEEE Transactions on Electron Devices, August 2006, Institute of Electrical & Electronics Engineers (IEEE)

    Shuichi Noda

  5. Damage-free metal-oxide-semiconductor gate electrode patterning on thin HfSiON film using neutral beam etching

    Article • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, July 2006, American Vacuum Society

    Shuichi Noda

  6. New Fabrication Technology of Fin Field Effect Transistors Using Neutral-Beam Etching

    Article • Japanese Journal of Applied Physics, June 2006, Japan Society of Applied Physics

    Shuichi Noda

  7. Fabrication of a Vertical-Channel Double-Gate Metal-Oxide-Semiconductor Field-Effect Transistor Using a Neutral Beam Etching

    Article • Japanese Journal of Applied Physics, March 2006, Japan Society of Applied Physics

    Shuichi Noda

  8. Highly anisotropic gate electrode patterning in neutral beam etching using F[sub 2] gas chemistry

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2005, American Vacuum Society

    Shuichi Noda

  9. A new fabrication technology of FinFETs using a neutral beam etching

    Article • January 2005, Institute of Electrical & Electronics Engineers (IEEE)

    Shuichi Noda

  10. 50 nm gate electrode patterning using a neutral-beam etching system

    Article • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, July 2004, American Vacuum Society

    Shuichi Noda

  11. Neutral Beam Etching for Damage-free 50 nm Gate Electrode Patterning

    Article • January 2003, Japan Society of Applied Physics

    Shuichi Noda

  12. Simulation of x-ray mask displacement by absorber and membrane stress

    Article • July 1996, SPIE

    Shuichi Noda

  13. High-precision EB technology with thin EB resist and distortion-free mask holder for x-ray mask fabrication

    Article • July 1995, SPIE

    Shuichi Noda

  14. Fabrication of reliable x-ray mask using high-temperature deposited SiN membrane by low-pressure chemical vapor deposition system

    Article • November 1994, SPIE

    Shuichi Noda

  15. MOS Gate Etching Using an Advanced Magnetron Etching System

    Article • Japanese Journal of Applied Physics, November 1989, Japan Society of Applied Physics

    Shuichi Noda

  16. Damage-free neutral beam etching technology for high mobility FinFETs

    Article • Institute of Electrical & Electronics Engineers (IEEE)

    Shuichi Noda