All Stories

  1. Assisted Nanopatterning of Tin-based Inorganic Resist: Effect of Peripheral Functional Group Population on Resolution and Sensitivity

    Article • November 2024, American Chemical Society (ACS)

    Mr. Santu Nandi

  2. Induced Chemical Networking of Organometallic Tin in a Cyclic Framework for Sub-10 nm Patterning and Interconnect Application

    Article • ACS Applied Nano Materials, March 2023, American Chemical Society (ACS)

    Mr. Santu Nandi, Dr Sunil Kumar

  3. Macrocycle Network-Aided Nanopatterning of Inorganic Resists on Silicon

    Article • ACS Applied Nano Materials, July 2022, American Chemical Society (ACS)

    Mr. Santu Nandi, Dr Sunil Kumar

  4. Broad Range (254–302 nm) and High Performance Ga2O3:SnO2 Based Deep UV Photodetector

    Article • IEEE Transactions on Nanotechnology, January 2022, Institute of Electrical & Electronics Engineers (IEEE)

    Mr. Santu Nandi

  5. Performance Evaluation of GaN-based Selective UV Photodetector by Varying Metal-Semiconductor-Metal Geometry

    Article • March 2019, Institute of Electrical & Electronics Engineers (IEEE)

    Mr. Santu Nandi

  6. Ferrocene Bearing Non-ionic Poly-aryl Tosylates: Synthesis, Characterization and Electron Beam Lithography Applications

    Article • Journal of Photopolymer Science and Technology, December 2018, Technical Association of Photopolymers, Japan

    Mr. Santu Nandi

  7. New non-chemically amplified molecular resist design with switchable sensitivity for multi-lithography applications and nanopatterning

    Article • Journal of Micromechanics and Microengineering, November 2017, Institute of Physics Publishing

    Mr. Santu Nandi

  8. A photoacid generator integrated terpolymer for electron beam lithography applications: sensitive resist with pattern transfer potential

    Article • Materials Chemistry Frontiers, January 2017, Royal Society of Chemistry

    Mr. Santu Nandi