All Stories

  1. Plasma diagnostics and deposition of functional zirconia thin films by reactive magnetron sputtering
  2. Erratum: “Energy distribution of positively and negatively charged plasma ions of a pulsed magnetron sputtering discharge in an argon/oxygen gas mixture and deposition of functional ZnO films” [J. Vac. Sci. Technol. A 43, 053002 (2025)]
  3. Energy distribution of positively and negatively charged plasma ions of a pulsed magnetron sputtering discharge in an argon/oxygen gas mixture and deposition of functional ZnO films
  4. Semiconductor WO3 thin films deposited by pulsed reactive magnetron sputtering
  5. Generation of Ammonia in a Pulsed Hollow Cathode Discharge Operated in an Ar/H2/N2 Gas Mixture Detected by Fourier Transform Infrared
  6. Energy distribution of negatively and positively charged ions in a magnetron sputtering discharge with a tungsten cathode and a positively biased anode in an argon/oxygen gas mixture
  7. Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O2 Gas Mixture
  8. A Pulsed Hollow Cathode Discharge Operated in an Ar/N$$_2$$/O$$_2$$ Gas Mixture and the Formation of Nitric Oxide
  9. CuFeO2 prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering
  10. Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2
  11. Pulse length dependence of a reactive high power impulse magnetron (HiPIMS) discharge
  12. Copper tungsten oxide (CuxWOy) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering
  13. Ion energy distribution of plasma ions of a hollow cathode discharge in Ar + N$$_2$$ and Ar + O$$_2$$ gas mixtures
  14. Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates
  15. Direct current and high power impulse magnetron sputtering discharges with a positively biased anode
  16. Surface Stoichiometry and Depth Profile of Tix-CuyNz Thin Films Deposited by Magnetron Sputtering
  17. A positively biased external anode for energy control of plasma ions: hollow cathode and magnetron sputtering discharge
  18. Time-resolved diagnostics of a bipolar HiPIMS discharge
  19. Time-resolved Langmuir probe diagnostics of a bipolar high power impulse magnetron sputtering discharge
  20. Modified high frequency probe approach for diagnostics of highly reactive plasma
  21. Time-resolved optical emission spectroscopy of a unipolar and a bipolar pulsed magnetron sputtering discharge in an argon/oxygen gas mixture with a cobalt target
  22. Surface Stoichiometry and Optical Properties of Cux–TiyCz Thin Films Deposited by Magnetron Sputtering
  23. Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge
  24. Generation of positively and negatively charged molecular ions during sputtering of a copper target by low-energy Ar+ ion bombardment in a dilute argon/oxygen gas mixture
  25. Pressure dependence of singly and doubly charged ion formation in a HiPIMS discharge
  26. Formation of Cun+ (n=1-3), Arn+ (n=1,2), and ArCu+ ions during sputtering of a copper surface by low-energy Ar+ ion bombardment in a dilute argon atmosphere.
  27. Influence of reactive oxygen species during deposition of iron oxide films by high power impulse magnetron sputtering
  28. Spectroscopic Study of Plasma Polymerized a-C:H Films Deposited by a Dielectric Barrier Discharge
  29. Deposition and characterization of organic polymer thin films using a dielectric barrier discharge with different C2Hm/N2 (m = 2, 4, 6) gas mixtures
  30. Atmospheric effect corrections of MuSTAnG data
  31. Negatively and positively charged oxygen ion formation in collisions of positively charged projectiles with O$_{2}$ molecules in the energy range 50–350 keV
  32. Study of mass and cluster flux in a pulsed gas system with enhanced nanoparticle aggregation
  33. DC Operated Air Plasma Jet for Antimicrobial Copper Coatings on Temperature Labile Surfaces
  34. Infrared Spectroscopy of $$\hbox {CH}_4/\hbox {N}_{2}$$ CH 4 / N 2 and $$\hbox {C}_{2}\hbox {H}_{m}/\hbox {N}_{2}$$ C 2 H m / N 2 ( $${m = 2, 4, 6}$$ m = 2 , 4 , 6 ) Gas Mixtures in a Dielectric Barrier Discharge
  35. Time-resolved tuned diode laser absorption spectroscopy of pulsed plasma
  36. Antimicrobial copper-coatings on temperature labile surfaces deposited with a DC plasma jet operated with air
  37. Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges
  38. Pulsed gas aggregation for improved nanocluster growth and flux
  39. Development of fast heating electron beam annealing setup for ultra high vacuum chamber
  40. Time resolved tunable diode laser absoption spectroscopy of dual High Power Impulse Magnetron Sputtering discharges
  41. Ionized vapor deposition of antimicrobial Ti–Cu films with controlled copper release
  42. Angle-resolved investigation of ion dynamics in high power impulse magnetron sputtering deposition system
  43. Degradation of various textile dyes as wastewater pollutants under dielectric barrier discharge plasma treatment
  44. Application of the escape factor method for determination of excited states densities.
  45. Effects of Reactive Oxygen Species on Single Polycation Layers
  46. Velocity distribution of mass-selected nano-size cluster ions
  47. Superoxide-anion formation in collisions of positively charged argon ions with oxygen molecules
  48. Role of nitrogen in evolution of sp2/sp3 bonding and optical band gap in hydrogenated carbon nitride
  49. Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering
  50. Time-resolved Langmuir probe investigation of hybrid high power impulse magnetron sputtering discharges
  51. Shake up satellites and fluorescence property of carbon nitride and hydrogenated carbon nitride: Annealing effect
  52. Seasonal variations of the muon flux seen by muon telescope MuSTAnG
  53. In vivo examination of the local inflammatory response after implantation of Ti6Al4V samples with a combined low-temperature plasma treatment using pulsed magnetron sputtering of copper and plasma-polymerized ethylenediamine
  54. Directional sensitivity of MuSTAnG muon telescope
  55. Role of nitrogen in optical and electrical band gaps of hydrogenated/hydrogen free carbon nitride film
  56. Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma
  57. Chemical synthesis and surface morphology of amorphous hydrogenated carbon nitride film deposited by N2/CH4dielectric barrier discharge plasma
  58. Highly ionized physical vapor deposition plasma source working at very low pressure
  59. Note: Development of fast heating inert gas annealing apparatus operated at atmospheric pressure
  60. Deposition of Amorphous Hydrogenated Carbon Nitride Films with a Dielectric Barrier Discharge
  61. Ultra low-k property of hydrogenated carbon nitride: Chemical evaluation
  62. Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering
  63. Analysis of the Release Characteristics of Cu-Treated Antimicrobial Implant Surfaces Using Atomic Absorption Spectrometry
  64. Antimicrobial Potential of Copper-Containing Titanium Surfaces
  65. Energy dependence of small silver clusters sputtered by 150keV ions
  66. Application of Low-Temperature Plasma Processes for Biomaterials
  67. Plasma chemical reactions in C2H2/N2, C2H4/N2, and C2H6/N2 gas mixtures of a laboratory dielectric barrier discharge
  68. Low Cost Ferroelectric Loop Study Set up With New and Simple Compensation Circuit: Operated at Variable Frequencies
  69. Ellipsometric study of carbon nitride films deposited by DC-magnetron sputtering
  70. Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system
  71. Dependency of temperature on polarization in CH4/N2 dielectric barrier discharge plasma: A crude assumption
  72. Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti–Cu thin films
  73. Effect of nitrogen doping on TiO x N y thin film formation at reactive high-power pulsed magnetron sputtering
  74. Molecular dynamics of thermal vibration effects: Ar+Ni(100) collision system
  75. Fourier Analysis of Particle Motion in a Radio Frequency Plasma Under Pulsed Argon Ion Beam Bombardment
  76. Behavior of a porous particle in a radiofrequency plasma under pulsed argon ion beam bombardment
  77. Stability of a deposited liquid cluster
  78. Formation and Deposition of Nanosize Particles on Surfaces
  79. Role of Nitrogen in the Formation of HC−N Films by CH4/N2 Barrier Discharge Plasma: Aliphatic Tendency
  80. Dielectric barrier discharge plasma treatment on E. coli: Influence of CH4/N2, O2, N2/O2, N2, and Ar gases
  81. Development of metal nanocluster ion source based on dc magnetron plasma sputtering at room temperature
  82. Cancer cells (MCF-7, Colo-357, and LNCaP) viability on amorphous hydrogenated carbon nitride film deposited by dielectric barrier discharge plasma
  83. Rapid thermal annealing effect on amorphous hydrocarbon film deposited by CH4/Ar dielectric barrier discharge plasma on Si wafer: Surface morphology and chemical evaluation
  84. Physical properties of homogeneous TiO 2 films prepared by high power impulse magnetron sputtering as a function of crystallographic phase and nanostructure
  85. Structural characterization of amorphous hydrogenated-carbon nitride (aH-CNx) film deposited by CH4/N2 dielectric barrier discharge plasma: 13C, 1H solid state NMR, FTIR and elemental analysis
  86. Tunable diode laser absorption spectroscopy of argon metastable atoms in Ar/C 2 H 2 dusty plasmas
  87. Growth and melting of silicon supported silver nanocluster films
  88. Editorial
  89. Ion energy distribution of an inductively coupled radiofrequency discharge in argon and oxygen
  90. Surface morphology and composition of films grown by size-selected Cu nanoclusters
  91. Optical and chemical characterization of thin TiNx films deposited by DC-magnetron sputtering
  92. Interaction of injected dust particles with metastable neon atoms in a radio frequency plasma
  93. Formation of TiO x films produced by high-power pulsed magnetron sputtering
  94. Reactive deposition of TiN x layers in a DC-magnetron discharge
  95. Dynamical Analysis of Sputtering at Threshold Energy Range: Modelling of Ar+Ni(100) Collision System
  96. Microstructural and Chemical Evolution of –CH[sub 3]-Incorporated (Low-k) SiCO(H) Films Prepared by Dielectric Barrier Discharge Plasma
  97. Cytocompatibility of amorphous hydrogenated carbon nitride films deposited by CH[sub 4]/N[sub 2] dielectric barrier discharge plasmas with respect to cell lines
  98. Development of dielectric barrier discharge plasma processing apparatus for mass spectrometry and thin film deposition
  99. Flow of nanosize cluster-containing plasma in a magnetron discharge
  100. Chemical composition and bond structure of carbon-nitride films deposited by CH4/N2 dielectric barrier discharge
  101. Interaction of ion beams with dusty plasmas
  102. Blue Diode Laser Absorption Spectroscopy of Pulsed Magnetron Discharge
  103. Molecular Dynamics Study of a Thermal Expansion Coefficient: Ti Bulk with an Elastic Minimum Image Method
  104. Deposition of titanium/titanium oxide clusters produced by magnetron sputtering
  105. Formation of clusters through generation of free atoms
  106. Chemical Reaction Studies in CH 4 /Ar and CH 4 /N 2 Gas Mixtures of a Dielectric Barrier Discharge
  107. Aluminium atom density and temperature in a dc magnetron discharge determined by means of blue diode laser absorption spectroscopy
  108. Impact excitation of MF magnetron discharge for PVD processes
  109. Bombardment of Ni(100) surface with low-energy argons: molecular dynamics simulations
  110. Monte Carlo Simulations of the Electron Currents Collected by Electrostatic Probes
  111. Rotating dust ring in an RF discharge coupled with a dc-magnetron sputter source. Experiment and simulation
  112. Investigation of plasma parameters in the DC planar magnetron in balanced and unbalanced mode
  113. Investigation of a pulsed magnetron sputtering discharge with a vacuum pentode modulator power supply
  114. Partial dissociative ionization of SF 6 by electron impact using an ejected electron-ion coincidence technique
  115. Ejected electron-ion coincidence measurements of multiple ionization of argon by 10-24 keV electron impact
  116. Development of a new experimental setup for studying collisions of keV-electrons with thick and thin targets
  117. Micro-Disperse Particles in Plasmas: From Disturbing Side Effects to New Applications
  118. Micro-Disperse Particles in Plasmas: From Disturbing Side Effects to New Applications
  119. On the determination of energy fluxes at plasma–surface processes
  120. Energy influx from an rf plasma to a substrate during plasma processing
  121. Sputtering yield and dynamical analysis of surface: A comparison of four different Ar-surface interaction potentials
  122. Fundamental Processes of Plasma–Surface Interactions
  123. Thick-target X-ray bremsstrahlung spectra produced in 6.5 keV and 7.5 keVe--Hf collisions
  124. Angular Distribution of Hydrogen Fragment Ions in H+ - H2 Collisions
  125. Coherent excitation of H( n = 2) by electron capture in and collisions
  126. Evidence for electron capture to the continuum by protons scattered at non-0° angles from Ar atoms
  127. Ionoluminescence
  128. Characteristic and non-characteristic X-ray emission from SF $_6$ and SO $_2$ molecules by electron impact
  129. Bombardment-induced light emission from a Si(100) target
  130. Alignment of H(2 p ) in H + –H collisions
  131. Multiple ionization of argon by positron impact
  132. Doubly differential cross sections for the ionization of the molecule by electron impact
  133. Partial cross sections for excitation of He(3 1 D ) states by electron impact
  134. Multiple ionization of argon, krypton and xenon atoms by positron impact
  135. Absolute cross-section measurements of inner-shell ionization
  136. Coherent excitation of H(n=2) induced in H + -Ne and H + -Ar collisions
  137. Nonlinear photoelectric emission from metals
  138. Inner shell contributions to multiple ionization of argon by positron impact
  139. Photon angular correlations and pressure-dependent effects of helium 2 1 P and 3 1 P excitation by electrons
  140. Characteristic and non-characteristic X-ray emission by lepton impact
  141. Absolute cross sections for inner shell ionization by lepton impact
  142. Determination of rank 4 multipoles and of the partial cross sections for He( 3 1 D ) excitation by electron impact
  143. Doubly differential cross section for the ionization of the hydrogen molecule by the impact of 100-eV electrons
  144. Coherent excitation in few-electron atomic collisions systems
  145. Polarization studies of Lyman-? radiation emitted in atom-H2-molecule collisions
  146. L-shell ionization in Au/Ag foils by electron and positron impact
  147. Oxygen dependence of light emission from sputtered atoms and ions following ion bombardment of polycrystalline aluminum targets
  148. Light emission from sputtered atoms following ion bombardment of polycrystalline metal targets
  149. Simultaneous electron-photon excitation of helium (h(cross) omega =1.17 eV)
  150. L-shell ionization by positron and electron impact
  151. Two-photon bremsstrahlung of free atoms
  152. Electric dipole moments of H( n =2) induced in H + -He and H-He collisions
  153. Light emission from sputtered atoms following ion bombardment of polycrystalline Al and Cu targets
  154. Nonadiabatic behavior of the polarization of electric-field-induced Lyman-α radiation
  155. Alignment of H(2p) in H-He, Ne, Ar collisions
  156. Angular variation of the partial doubly differential cross sections for multiple ionization of argon atoms by electron impact
  157. Coincidence studies of capture and ionization in highly charged I q + -He and U q + -He collisions at medium velocities
  158. Plane wave born calculations of K-shell ionization at low velocities
  159. Coincidence studies of quasimolecular electron emission in 700-keV Ar 2 + -Kr collisions
  160. Spin effects in slow (H-He ) + collisions
  161. Alignment of H(2p) in H+H to H+H(2p) collisions
  162. Complete linear polarization of Lyman- α radiation from metastable hydrogen atoms in external electric fields
  163. Partial doubly differential cross sections for multiple ionization of argon, krypton, and xenon atoms by electron impact
  164. Dielectronic recombination of the B-like ions: N 2 + , O 3 + , and F 4 +
  165. Alignment of H ( 2 p ) in H + -H, H 2 collisions
  166. Partial cross sections for electron capture into specific n states for 0.1- and 0.25-MeV/nucleon I q + - H 2 collisions (q=12–18)
  167. Alignment and orientation of H(2p) following excitation in H-He, Ne, Ar collisions
  168. Excitation and Ionization in Atomic Collisions
  169. Coincidence spectroscopy of highly charged xenon ions by electron impact
  170. Polarization studies of H(2 p ) charge-exchange excitation: H + -He collisions
  171. Cross sections for charge-exchange excitation to H(2p) in proton – rare-gas-atom collisions (1 – 25 keV)
  172. Atomic effects of electrons and protons at low energies
  173. δ -electron spectroscopy of transfer and ionization in proton – rare-gas-atom collisions
  174. Double- and single-electron capture and loss in collisions of 1 – 2-MeV/u boron, oxygen, and silicon projectiles with helium atoms
  175. Angular distribution of photoelectrons from above-threshold ionization of Xe
  176. Polarization studies of H(2p) charge-exchange excitation: H + -Ar collisions
  177. Angular Correlation and Polarization Studies of Atomic Collisions
  178. Electron spectroscopy of multiple ionization of argon by electron impact
  179. Electron Capture to Continuum States From Inner Shells
  180. Impact Ionization by Fast Projectiles
  181. L-subshell ionisation of Au by light-ion impact
  182. Threshold behaviour of Ar K and Xe L3 ionisation by electron impact
  183. L X-ray anisotropy and L 3 -subshell alignment of heavy atoms induced by ion impact
  184. Ion-Photon Angular Correlations in Slow Atomic Collisions
  185. Plane wave born cross sections including exchange forK-shell ionization of light atoms
  186. Evidence for rotationally induced 4fσ excitation in slow Kr-Xe and Kr-Kr collisions
  187. Coincidence measurements of M-shell excitation in slow Xe-Xe collisions
  188. Comment on 'L-subshell ionisation cross sections of xenon by electron impact near threshold region'
  189. Z Dependence of Bremsstrahlung Radiation from Free Atoms
  190. Ionization of xenon L subshells by low-energy electron impact
  191. Angular distribution of X-radiation following electron bombardment of free atoms
  192. L-shell alignment of heavy atoms induced by proton impact ionisation
  193. Bielefelder Universitätstage 1978
  194. Direct and charge-exchange excitation of the 2 1 P level in He + -He collisions
  195. Excitation of the Ne resonance transitions in Ne + -Ne collisions at intermediate velocities
  196. Outer s-shell ionization of neon, argon and krypton by N + , Ne + and Ne 2+ impact
  197. Outer s-shell ionization of neon, argon, and krypton by proton impact (125 keV-1200 keV)
  198. Coherence studies of atomic collisions
  199. A “Laudatio” for Professor Hans Kleinpoppen