All Stories

  1. Surface energy engineering for LiTaO3 and α-quartz SiO2 for low temperature (<220 °C) wafer bonding
  2. Measuring Surface Energies of GaAs (100) and Si (100) by Three Liquid Contact Angle Analysis (3LCAA) for Heterogeneous Nano-BondingTM
  3. Comparative Study of Surface Energies of Native Oxides of Si(100) and Si(111) via Three Liquid Contact Angle Analysis
  4. Determining Canine Blood and Human Blood Composition by Congealing Microliter Drops into Homogeneous Thin Solid Films (HTSFs) via HemaDrop™
  5. Accurate blood diagnostic using Ion Beam Analysis on blood drops
  6. Lasting Non-toxic Anti-fog
  7. How to measure molecules on Si surfaces and their effect of surface tension.
  8. Ion Beam Analysis Of Silicon-Based Surfaces And Correlation With Surface Energy Measurements
  9. Particle-Induced X-Ray Emission (PIXE) Of Silicate Coatings On High Impact Resistance Polycarbonates
  10. A New 3D Multistring Code to Identify Compound Oxide Nanophase With Ion Channeling
  11. Atomic displacement free interfaces and atomic registry in SiO2∕(1×1) Si(100)
  12. Infrared spectroscopic analysis of an ordered Si/SiO2 interface
  13. The formation of ordered, ultrathin SiO2/Si(100) interfaces grown on (1×1) Si(100)
  14. Heteroepitaxial properties of Si1−x−yGexCy on Si(100) grown by combined ion- and molecular-beam deposition
  15. Microstructure and ion beam characterization of heteroepitaxial Si1−x−yGexCy
  16. Characterization of carbon in heteroepitaxial Si1 − x − yGexCy thin films via combined ion channeling and nuclear resonance analysis
  17. Hydrogen passivation of Si(100) wafers as templates for low temperature (T < 600°C) epitaxy
  18. Comparative study on dry oxidation of heteroepitaxial Si1−xGexand Si1−x−yGexCyon Si(100)+
  19. The onset of secondary phase precipitation during synthesis of heteroepitaxial Si1−x−yGexCy on Si(100)
  20. SIMS, EDX, EELS, AES, XPS study of interphases in nicalon fibre-LAS glass matrix composites
  21. Damage-to-dose ratio after low energy silicon ion implantation into crystalline silicon
  22. Microstructure and stoichiometry dependence of ion beam nitrides as a function of energy and temperature: A comparative study between Si and SiGe
  23. Role of ion energy in ion beam oxidation of semiconductors: Experimental study and model
  24. Kinetics of ion beam nitridation (IBN) of Si and of MBE-grown Ge and SixGe1−x alloys: The role of ion energy, ion dose and substrate temperature
  25. Structure and properties of silicon nitride and nitride prepared by direct low energy ion beam nitridation
  26. New SiGe dielectrics grown at room temperature by low‐energy ion beam oxidation and nitridation
  27. Stability of C49 and C54 phases of TiSi2under ion bombardment
  28. A quantitative model of point defect diffusivity and recombination in ion beam deposition and combined ion and molecular deposition
  29. Ion beam oxidation of GaAs: The role of ion energy
  30. Epitaxy and Chemical Reactions During Thin Film Formation from Low Energy Ions New Kinetic Pathways, New Phases and New Properties
  31. Shallow-junction diode formation by implantation of arsenic and boron through titanium-silicide films and rapid thermal annealing
  32. The role of interfacial segregation and microstructure in interdiffusion between aluminum and silicon
  33. Ion beam deposition in materials research
  34. A Model for Interdiffusion at Metal Semiconductor Interfaces: Conditions for Spiking
  35. Integrated Processinyg of Silicided Shallow Junctions using Rapid Thermal Annealing Prior to Dopant Activation
  36. Low‐temperature epitaxy of Si and Ge by direct ion beam deposition
  37. Ion Beam Deposition
  38. Low-temperature epitaxial growth of Si and Ge and fabrication of isotopic heterostructures by direct ion beam deposition
  39. A comparison of AES, SIMS, ISS and RBS analysis of Si x N y layers
  40. Ion-solid interactions during ion beam deposition of 74Ge and 30Si on Si at very low ion energies (0–200 eV range)
  41. RBS study of the effect of arsenic and phosphorus interfacial segregation upon the sintering of contacts between implanted polycrystalline silicon and aluminum: Silicon(1%)
  42. Comparative study of Nb and TiW barrier layers between Au and a‐SiO2
  43. Arsenic Dopant Influence upon the Sintering Behavior of the Aluminum-Polysilicon Interface
  44. Surface Characterization of Arsenic Implanted Silicon (100): A New Insight into the Inhibition of Aluminum/Silicon Interdiffusion