All Stories

  1. Intermetallic compound layer formation in indium-based micro-bump array fabrication technology for IR detectors
  2. Optical Properties of Amorphous Carbon Thin Films Fabricated Using a High-Energy-Impulse Magnetron-Sputtering Technique
  3. Carbon ion self–sputtering attained by sublimation of hot graphite target and controlled by pulse injection of a neon–helium gas mixture
  4. The Amorphous Carbon Thin Films Synthesized by Gas Injection Magnetron Sputtering Technique in Various Gas Atmospheres
  5. Multi-component low and high entropy metallic coatings synthesized by pulsed magnetron sputtering
  6. On the Control of Hot Nickel Target Magnetron Sputtering by Distribution of Power Pulses
  7. Design of thin DLC/TiO2 film interference coatings on glass screen protector using a neon–argon-based gas injection magnetron sputtering technique
  8. Application of the plasma surface sintering conditions in the synthesis of ReBx–Ti targets employed for hard films deposition in magnetron sputtering technique
  9. The sputtering of titanium magnetron target with increased temperature in reactive atmosphere by gas injection magnetron sputtering technique
  10. Applications insight into the plasmochemical state and optical properties of amorphous CNx films deposited by gas injection magnetron sputtering method
  11. The influence of thermal stability on the properties of Cu3N layers synthesized by pulsed magnetron sputtering method
  12. TiO2 coating fabrication using gas injection magnetron sputtering technique by independently controlling the gas and power pulses
  13. Synthesis of Copper Nitride Layers by the Pulsed Magnetron Sputtering Method Carried out under Various Operating Conditions
  14. Design of pulsed neon injection in the synthesis of W-B-C films using magnetron sputtering from a surface-sintered single powder cathode
  15. Enhancement of Oxidation of Formic Acid through Application of Zirconia Matrix for Immobilization of Noble Metal Catalytic Nanoparticles
  16. TiO2 - based decorative interference coatings produced at industrial conditions
  17. The state of coating–substrate interfacial region formed during TiO2 coating deposition by Gas Injection Magnetron Sputtering technique
  18. Surface sintering of tungsten powder targets designed by electromagnetic discharge: A novel approach for film synthesis in magnetron sputtering
  19. Influence of generation control of the magnetron plasma on structure and properties of copper nitride layers
  20. Influence of annealing on electronic properties of thin AlN films deposited by magnetron sputtering method on silicon substrates
  21. Physical Modelling of the Production of an Alloy Vapour Source for the Synthesis of Dielectric Material
  22. Chemical and structural characterization of tungsten nitride (WNx) thin films synthesized via Gas Injection Magnetron Sputtering technique
  23. Plasmochemical investigations of DLC/WCx nanocomposite coatings synthesized by gas injection magnetron sputtering technique
  24. Optical TiO2 layers deposited on polymer substrates by the Gas Injection Magnetron Sputtering technique
  25. Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes
  26. Characteristic STATE of substrate and coatings interface formed by Impulse Plasma Deposition method
  27. Relation between modulation frequency of electric power oscillation during pulse magnetron sputtering deposition of MoNx thin films
  28. Phase composition of copper nitride coatings examined by the use of X-ray diffraction and Raman spectroscopy
  29. Structure and Electrical Resistivity Dependence of Molybdenum Thin Films Deposited by DC Modulated Pulsed Magnetron Sputtering
  30. Characterization of sp 3 bond content of carbon films deposited by high power gas injection magnetron sputtering method by UV and VIS Raman spectroscopy
  31. Copper nitride layers synthesized by pulsed magnetron sputtering
  32. Multi-sided metallization of textile fibres by using magnetron system with grounded cathode
  33. Diamond, graphite, and graphene oxide nanoparticles decrease migration and invasiveness in glioblastoma cell lines by impairing extracellular adhesion
  34. Reactive sputtering of titanium compounds using the magnetron system with a grounded cathode
  35. Structure of Cu–N layers synthesized by pulsed magnetron sputtering with variable frequency of plasma generation
  36. Optical and microstructural characterization of amorphous-like Al 2 O 3 , SnO 2 and TiO 2 thin layers deposited using a pulse gas injection magnetron sputtering technique
  37. TiO2-based decorative coatings deposited on the AISI 316L stainless steel and glass using an industrial scale magnetron
  38. OES studies of plasmoids distribution during the coating deposition with the use of the Impulse Plasma Deposition method controlled by the gas injection
  39. Computational Studies of the Impulse Plasma Deposition Method
  40. The application of magnetic self-filter to optimization of AIN film growth process during the impulse plasma deposition synthesis
  41. Novel GIMS technique for deposition of colored Ti/TiO₂ coatings on industrial scale
  42. The role of magnetic energy on plasma localization during the glow discharge under reduced pressure
  43. Titanium nitride coatings synthesized by IPD method with eliminated current oscillations
  44. Characterization of microstructural, mechanical and optical properties of TiO2 layers deposited by GIMS and PMS methods
  45. Structure of AlN films deposited by magnetron sputtering method
  46. Synthesis of multicomponent metallic layers during impulse plasma deposition
  47. Methods of optimization of reactive sputtering conditions of Al target during AlN films deposition
  48. Impulse Plasma In Surface Engineering - a review
  49. Zastosowanie metody IPD do syntezy warstw c-AlN
  50. Peculiar Role of the Metallic States on the Nano-MoS2Ceramic Particle Surface in Antimicrobial and Antifungal Activity
  51. Electric field used as the substitute for ultrasounds in the liquid exfoliation of hexagonal boron nitride
  52. Optimization of gas injection conditions during deposition of AlN layers by novel reactive GIMS method
  53. Computational modelling of discharges within the impulse plasma deposition accelerator with a gas valve
  54. On coating adhesion during impulse plasma deposition
  55. Gas injection as a tool for plasma process control during coating deposition
  56. Dependence of the specific features of two PAPVD methods: Impulse Plasma Deposition (IPD) and Pulsed Magnetron Sputtering (PMS) on the structure of Fe–Cu alloy layers
  57. Nanoparticle Direct Doping: Novel Method for Manufacturing Three-Dimensional Bulk Plasmonic Nanocomposites
  58. Morphology of the TiN coatings obtained by the IPD method with two frequencies of impulse plasma generation
  59. Properties of TiN coatings deposited by the modified IPD method
  60. New contact acoustic emission detector for texture evaluation of apples
  61. Structure of Fe–Cu alloy layers deposited by IPD method with different frequencies of plasma impulse generation
  62. Nanostructured Alloy Layers With Magnetic Properties Obtained by the Impulse Plasma Deposition
  63. Electric Characterization and Selective Etching of Aluminum Oxide
  64. The Influence of Growth Temperature on Oxygen Concentration in GaN Buffer Layer
  65. MHD Modelling of Flow Phenomena during the Impulse Plasma Deposition Process
  66. Interaction between dislocations density and carrier concentration of gallium nitride layers
  67. Layers of magnetic alloys produced by impulse plasma deposition
  68. Concept, techniques, deposition mechanism of impulse plasma deposition — A short review
  69. Computational studies of plasma dynamics in Impulse Plasma Deposition coaxial accelerator
  70. Modeling of Flow Phenomena During the Impulse Plasma Deposition Process
  71. Influence of Severe Plastic Deformation on the PLC Effect and Mechanical Properties in Al 5XXX Alloy
  72. Growth of nanopillar CNx layer during impulse plasma deposition
  73. Mechanism of coating formation in conditions of impulse plasma deposition
  74. Studies of Discharge Parameters Influence on the IPD Plasma Deposition Process
  75. Structural features of films obtained by the impulse plasma deposition method
  76. Studies of squirrel cage type coaxial accelerator for IPD process
  77. Phase structure of the Fe–Ti layers produced by the IPD method
  78. Impulse plasma deposition of magnetic nanocomposite layers
  79. Peculiarities of thin film deposition by means of reactive impulse plasma assisted chemical vapor deposition (RIPACVD) method
  80. Influence of the gas pressure on the initial phase in coaxial accelerator
  81. Investigations of discharge phenomena in IPD coaxial accelerator with squirrel cage electrodes
  82. Rayleigh–Taylor instability in plasma jet from IPD accelerator
  83. Impulse plasma deposition of aluminum oxide layers for Al2O3/Si, SiC, GaN systems
  84. Snow plow model of IPD discharge
  85. The effect of structural features on mechanical properties of loose optical fiber poly(butylene terephthalate) tubes
  86. Effect of structural features of poly(butylene terephthalate) tubes on the useful properties of the loose tube/optical fibers system in the tubular optical fiber cables
  87. Physical Phenomena in Z-pinch Plasma of Impulse Plasma Deposition Process
  88. Modelling of plasma dynamics in coaxial IPD accelerator
  89. Investigation of current sheet dynamics in the IPD accelerator
  90. Experimental studies of current sheet structure in IPD coaxial accelerator
  91. Al2O3 Layers for Microelectronics Applications
  92. SiC/DLC Composite Layers Synthesised by the IPD Method
  93. Some Technological Aspects of Optical Fibre Cable Production
  94. Effect of interlayer composition on the tribological properties of TiC/Ti(Cx,N1−x)/TiN anti-abrasive multi-layer coatings
  95. Investigation of adhesion between component layers of a multi-layer coating TiC/Ti(Cx, N1−x)/TiN by the scratch-test method
  96. Computer simulations and experimental results in studies of plasma dynamics during the impulse plasma deposition process
  97. Investigation of the influence of chemical composition of Ti(CxN1−x) layer on the stresses value in the multilayer coating TiC/Ti(CxN1−x)/TiN
  98. Influence of Plasma Dynamics on Material Synthesis Product of IPD Process
  99. Structure of alumina oxide coatings deposited by impulse plasma method
  100. The influence of the tribological properties of the crystallographic match of TiC⧹Ti(CxN1-x)⧹TiN multi-layers
  101. Combined impulse-stationary impulse plasma deposition
  102. Duplex antiabrasive coatings (Fe-based alloy-tin) produced by impulse plasma deposition
  103. Physical model of dynamic phenomena in impulse plasma coaxial accelerator
  104. Defects developed in Ni-coatings deposited by the impulse plasma on metal substrates
  105. Distribution of magnetic field in the coaxial accelerator of impulse plasma
  106. Nanocrystalline C=N thin films
  107. Spreading of impulse plasma within a coaxial accelerator
  108. Nanoporosity of Al2O3 coatings obtained by impulse plasma deposition
  109. Laser-induced reactive crystallization of metastable BN from copper implanted with B+ and N2+ ions
  110. Transmission electron microscopy investigation into the recrystallization of carbon resulting from laser processing of carbon-implanted copper
  111. Synthesis of Al2O3 condensates from impulse plasma
  112. Estimation of the coating/substrate interface temperature during deposition by impulse plasma excitation
  113. Graphite microregions effect upon the Si-diamond layer junction properties
  114. Diamond layers deposited from impulse plasma
  115. Formation of metallic coatings on non-heated substrates by the impulse plasma method
  116. Reduction of turbulence in an impulse-plasma accelerator operating in a quasi-stayionary mode
  117. Mechanism of crystallization of multicomponent metallic coatings using the impulse plasma method
  118. State of impulse plasma in the coaxial generator with continuous gas flow examined by indirect observations
  119. The structure and mechanical properties of carbon layers formed by crystallization from pulse plasma
  120. Al/sub 2/O/sub 3/ layers for microelectronic applications
  121. Titanium oxide produced by plasma technology for MOS structures