All Stories

  1. Highly vibrationally excited O 2 molecules in low-pressure inductively-coupled plasmas detected by high sensitivity ultra-broad-band optical absorption spectroscopy

    Article • Plasma Sources Science and Technology, July 2015, Institute of Physics Publishing

    Dr Emile A D Carbone, Dr Jean-Paul Booth

  2. Ground state bromine atom density measurements by two-photon absorption laser-induced fluorescence

    Article • Plasma Sources Science and Technology, September 2014, Institute of Physics Publishing

    Dr Jean-Paul Booth

  3. Global (volume-averaged) model of inductively coupled chlorine plasma: Influence of Cl wall recombination and external heating on continuous and pulse-modulated plasmas

    Article • Plasma Sources Science and Technology, June 2014, Institute of Physics Publishing

    Dr Jean-Paul Booth, Dr Emile A D Carbone

  4. Electron heating in capacitively coupled plasmas revisited

    Article • Plasma Sources Science and Technology, May 2014, Institute of Physics Publishing

    Dr Jean-Paul Booth

  5. Equivalence of the hard-wall and kinetic-fluid models of collisionless electron heating in capacitively coupled discharges

    Article • Plasma Sources Science and Technology, February 2014, Institute of Physics Publishing

    Dr Jean-Paul Booth

  6. Experimental and numerical study of fast gas heating and O atom production in a capillary nanosecond discharge

    Article • January 2014, American Institute of Aeronautics and Astronautics (AIAA)

    Dr Jean-Paul Booth

  7. Capacitively coupled radio-frequency plasmas excited by tailored voltage waveforms

    Article • Plasma Physics and Controlled Fusion, November 2013, Institute of Physics Publishing

    Dr Jean-Paul Booth

  8. Theory for the self-bias formation in capacitively coupled plasmas excited by arbitrary waveforms

    Article • Plasma Sources Science and Technology, November 2013, Institute of Physics Publishing

    Dr Jean-Paul Booth

  9. Ozone kinetics in low-pressure discharges: vibrationally excited ozone and molecule formation on surfaces

    Article • Plasma Sources Science and Technology, September 2013, Institute of Physics Publishing

    Vasco Guerra, Dr Jean-Paul Booth

  10. Global model of inductively coupled radio-frequency Cl2 plasma: Dissociation, excitation and power modulation

    Article • June 2013, Institute of Electrical & Electronics Engineers (IEEE)

    Dr Jean-Paul Booth, Dr Emile A D Carbone

  11. Radio-frequency capacitively coupled plasmas excited by tailored voltage waveforms: comparison of experiment and particle-in-cell simulations

    Article • Journal of Physics D Applied Physics, May 2013, Institute of Physics Publishing

    Dr Jean-Paul Booth

  12. Tailored Voltage Waveform Deposition of Microcrystalline Silicon Thin Films from Hydrogen-Diluted Silane and Silicon Tetrafluoride: Optoelectronic Properties of Films

    Article • Japanese Journal of Applied Physics, August 2012, Japan Society of Applied Physics

    Dr Jean-Paul Booth

  13. Tailored Voltage Waveform Deposition of Microcrystalline Silicon Thin Films from Hydrogen-Diluted Silane and Silicon Tetrafluoride: Optoelectronic Properties of Films

    Article • Japanese Journal of Applied Physics, August 2012, Japan Society of Applied Physics

    Dr Jean-Paul Booth

  14. Nanocrystalline silicon film growth morphology control through RF waveform tailoring

    Article • Journal of Physics D Applied Physics, September 2010, Institute of Physics Publishing

    Dr Jean-Paul Booth

  15. Electron transport coefficients in mixtures of CF4and CF2radicals

    Article • Plasma Sources Science and Technology, May 2009, Institute of Physics Publishing

    Dr Jean-Paul Booth

  16. The Effect of Discharge Chamber Geometry on the Characteristics of Low-Pressure RF Capacitive Discharges

    Article • IEEE Transactions on Plasma Science, April 2007, Institute of Electrical & Electronics Engineers (IEEE)

    Dr Jean-Paul Booth

  17. Fluorine negative ion density measurement in a dual frequency capacitive plasma etch reactor by cavity ring-down spectroscopy

    Article • Applied Physics Letters, April 2006, American Institute of Physics

    Dr Jean-Paul Booth

  18. Metastable CF and CF2molecules in CF4inductively-coupled plasmas

    Article • Plasma Sources Science and Technology, January 2006, Institute of Physics Publishing

    Dr Jean-Paul Booth

  19. Use of the ultraviolet absorption spectrum of CF2 to determine the spatially resolved absolute CF2 density, rotational temperature, and vibrational distribution in a plasma etching reactor

    Article • The Journal of Chemical Physics, May 2004, American Institute of Physics

    Dr Jean-Paul Booth

  20. Broadband absorption and ab initio results on the CF C 2Σ+–X 2Π system

    Article • The Journal of Chemical Physics, January 2003, American Institute of Physics

    Dr Jean-Paul Booth

  21. CF A 2Σ+–X 2Π and B 2Δ–X 2Π study by broadband absorption spectroscopy in a plasma etch reactor: Determination of transition probabilities, CF X 2Π concentrations, and gas temperatures

    Article • The Journal of Chemical Physics, January 2003, American Institute of Physics

    Dr Jean-Paul Booth

  22. Gas temperature gradients in a CF4 inductive discharge

    Article • Journal of Applied Physics, October 2002, American Institute of Physics

    Dr Jean-Paul Booth

  23. Diagnostics of etching plasmas

    Article • Pure and Applied Chemistry, January 2002, De Gruyter

    Dr Jean-Paul Booth

  24. Chlorine dissociation fraction in an inductively coupled plasma measured by ultraviolet absorption spectroscopy

    Article • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, January 2002, American Vacuum Society

    Dr Jean-Paul Booth

  25. Optical and electrical diagnostics of fluorocarbon plasma etching processes

    Article • Plasma Sources Science and Technology, January 1999, Institute of Physics Publishing

    Dr Jean-Paul Booth

  26. Developments of Basic Researches on Fluorocarbon Plasmas for Material Processing. 7. CFx Radical Creation and Destruction at Surfaces in Fluorocarbon Plasmas.

    Article • Journal of Plasma and Fusion Research, January 1999, Japan Society of Plasma Science and Nuclear Fusion Research

    Dr Jean-Paul Booth

  27. Absolute radical densities in etching plasmas determined by broad-band UV absorption spectroscopy

    Article • Plasma Sources Science and Technology, August 1998, Institute of Physics Publishing

    Dr Jean-Paul Booth

  28. Laser-induced fluorescence detection of as a primary product of Si and reactive ion etching with gas

    Article • Plasma Sources Science and Technology, August 1997, Institute of Physics Publishing

    Dr Jean-Paul Booth

  29. Optical Diagnostics of Plasmas: A Tool for Process Control

    Article • January 1997, Springer Science + Business Media

    Dr Jean-Paul Booth

  30. Kinetics of Radicals in Fluorocarbon Plasmas for Treatment of Polymers

    Article • January 1997, Springer Science + Business Media

    Dr Jean-Paul Booth

  31. A novel electrostatic probe method for ion flux measurements

    Article • Plasma Sources Science and Technology, November 1996, Institute of Physics Publishing

    Dr Jean-Paul Booth

  32. Sheath electric field oscillation and ion kinetics in radio-frequency discharges

    Article • Journal of Applied Physics, June 1996, American Institute of Physics

    Dr Jean-Paul Booth

  33. Quantitative Laser-Induced Fluorescence Spectroscopy of the CF A2Σ+−X2Π Transition:  Electronic Transition Dipole Moment Function and Predissociation

    Article • The Journal of Physical Chemistry B, January 1996, American Chemical Society (ACS)

    Dr Jean-Paul Booth

  34. Time-resolved electric-field measurements in 30 kHz hydrogen discharges by optical emission Stark spectroscopy

    Article • Journal of Applied Physics, July 1993, American Institute of Physics

    Dr Jean-Paul Booth

  35. Hydrogen plasma treatment: desorption of atomic hydrogen from silicon surfaces studied by in-situ spectroscopic ellipsometry

    Article • January 1991, Elsevier

    Dr Jean-Paul Booth

  36. Laser Induced Fluorescence Measurements in Plasma Etching Processes

    Article • January 1990, Springer Science + Business Media

    Dr Jean-Paul Booth

  37. Plasma Diagnostics by Laser-Induced Fluorescence

    Article • MRS Proceedings, January 1988, Springer Science + Business Media

    Dr Jean-Paul Booth