All Stories

  1. High NA EUV: progress update and mask impact

    Article • September 2023, SPIE

    Dr Jan Van Schoot

  2. The Moore's Law Machine: The Next Trick to Tinier Transistors is High-Numerical-Aperture EUV Lithography

    Article • IEEE Spectrum, September 2023, Institute of Electrical & Electronics Engineers (IEEE)

    Dr Jan Van Schoot

  3. High-NA EUVL exposure tool: program progress and mask interaction

    Article • September 2022, SPIE

    Dr Jan Van Schoot

  4. High NA EUV enabling cost efficient scaling for N+1 technology nodes

    Article • June 2022, SPIE

    Dr Jan Van Schoot

  5. EUV optics: status, outlook and future

    Article • May 2022, SPIE

    Dr Jan Van Schoot

  6. High-NA EUVL exposure tool: key advantages and program status

    Article • September 2021, SPIE

    Dr Jan Van Schoot

  7. High-NA EUV imaging: challenges and outlook

    Article • August 2019, SPIE

    Dr Jan Van Schoot

  8. Next-generation lithography – an outlook on EUV projection and nanoimprint

    Article • Advanced Optical Technologies, January 2017, De Gruyter

    Dr Jan Van Schoot

  9. Anamorphic imaging at high-NA EUV: mask error factor and interaction between demagnification and lithographic metrics

    Article • October 2016, SPIE

    Dr Jan Van Schoot

  10. Introduction to the next generation High-NA EUV lithography exposure tools

    Article • SPIE Newsroom, January 2016, SPIE

    Dr Jan Van Schoot

  11. EUV High-NA scanner and mask optimization for sub 8 nm resolution

    Article • November 2015, SPIE

    Dr Jan Van Schoot

  12. Experimental validation of novel mask technology to reduce mask 3D effects

    Article • October 2015, SPIE

    Dr Jan Van Schoot

  13. Imaging performance of the EUV high NA anamorphic system

    Article • September 2015, SPIE

    Dr Jan Van Schoot

  14. Anamorphic high-NA EUV lithography optics

    Article • September 2015, SPIE

    Dr Jan Van Schoot

  15. EUV lithography scanner for sub-8nm resolution

    Article • March 2015, SPIE

    Dr Jan Van Schoot

  16. EUV lithography optics for sub-9nm resolution

    Article • March 2015, SPIE

    Dr Jan Van Schoot

  17. EUV simulation extension study for mask shadowing effect and its correction

    Article • March 2008, SPIE

    Dr Jan Van Schoot

  18. Photoresist induced contrast loss and its impact on EUV imaging extendibility

    Article • March 2008, SPIE

    Dr Jan Van Schoot

  19. Utilization of Insitu Metrology Capability of ASML Lithography Scanner to Improve Overall Process Control

    Article • September 2006, Institute of Electrical & Electronics Engineers (IEEE)

    Dr Jan Van Schoot

  20. CD uniformity improvement by active scanner corrections

    Article • July 2002, SPIE

    Dr Jan Van Schoot

  21. Can DUV take us below 100 nm?

    Article • September 2001, SPIE

    Dr Jan Van Schoot

  22. Analysis of full-wafer/full-batch CD uniformity using electrical linewidth measurements

    Article • April 2001, SPIE

    Dr Jan Van Schoot

  23. KrF lithography for 130 nm

    Article • July 2000, SPIE

    Dr Jan Van Schoot

  24. Mask error factor: causes and implications for process latitude

    Article • July 1999, SPIE

    Dr Jan Van Schoot

  25. 0.7-NA DUV step-and-scan system for 150-nm imaging with improved overlay

    Article • July 1999, SPIE

    Dr Jan Van Schoot

  26. Understanding systematic and random CD variations using predictive modeling techniques

    Article • July 1999, SPIE

    Dr Jan Van Schoot

  27. Performance of a step-and-scan system for DUV lithography

    Article • July 1997, SPIE

    Dr Jan Van Schoot

  28. Demonstrating next-generation CD uniformity with today's tools and processes

    Article • February 1997, SPIE

    Dr Jan Van Schoot

  29. Fundamentals of EUV Lithography Exposure Tools

    Article • SPIE

    Dr Jan Van Schoot