All Stories

  1. Structural impact on the nanoscale optical properties of InGaN core-shell nanorods
  2. Nano-cathodoluminescence reveals the effect of electron damage on the optical properties of nitride optoelectronics and the damage threshold
  3. Growth of non-polar InGaN quantum dots with an underlying AlN/GaN distributed Bragg reflector by metal-organic vapour phase epitaxy
  4. Materials characterization and the evolution of materials
  5. Nanocathodoluminescence Reveals Mitigation of the Stark Shift in InGaN Quantum Wells by Si Doping
  6. Advanced low-energy durable coatings
  7. UV Engineering of High-k Thin Films
  8. Optical Emission Analysis of Molecular Nitrogen by Using a Self-Resonating Dielectric Barrier Plasma Reactor
  9. Oxide Nanoparticle Thin Films Created Using Molecular Templates
  10. Excimer ultraviolet sources for thin film deposition: a 15 year perspective
  11. A novel route for the inclusion of metal dopants in silicon
  12. Template Epitaxial Growth of Thermoelectric Bi/BiSb Superlattice Nanowires by Charge-Controlled Pulse Electrodeposition
  13. Composition dependence of electronic structure and optical properties of Hf1−xSixOy gate dielectrics
  14. Silicon nanoclusters containing nitrogen and sensitization of erbium luminescence in SiOx:Er
  15. Development of an electrically tuneable Bragg grating filter in polymer optical fibre operating at 1.55 µm
  16. Control of embedded Si nanocrystals in SiO2 by rapid thermal annealing and enhanced photoluminescence characterization
  17. Deposition and growth kinetics studies of thin zirconium dioxide films by UVILS-CVD
  18. Hf1−xSixOy dielectric films deposited by UV-photo-induced chemical vapour deposition (UV-CVD)
  19. UV detection for excimer lamps using CVD diamond in various gaseous atmospheres
  20. Electrically tunable Bragg gratings in single-mode polymer optical fiber
  21. Enhanced luminescence from encapsulated silicon nanocrystals in SiO2 with rapid thermal anneal
  22. Development and application of UV excimer lamps from 354nm -126nm
  23. Electrical property improvements of yttrium oxide-based metal-insulator-metal capacitors
  24. Grating based devices in polymer optical fibre
  25. Sir John Ambrose Fleming - His Involvement in the Development of Wireless
  26. Nitridation and reoxidation of high-kmetal oxide thin films using argon excimer sources
  27. Laser morphological manipulation of gold nanoparticles periodically arranged on solid supports
  28. Direct Si oxidation with fluorine incorporation using an argon excimer VUV source
  29. Excimer VUV formation of erbium-doped silica layers
  30. Large-area In2O3 ordered pore arrays and their photoluminescence properties
  31. Electrical characterization of HfO2 films obtained by UV assisted injection MOCVD
  32. Post deposition UV-induced O2 annealing of HfO2 thin films
  33. Enhancement of luminescence from encapsulated Si nanocrystals in SiO2 with rapid thermal anneals
  34. Direct nitridation of high-k metal oxide thin films using argon excimer sources
  35. Strong erbium photoluminescence from erbium-doped silica layers prepared using excimer VUV lamps
  36. Correlation of compositional and structural changes during pulsed laser deposition of tantalum oxide films
  37. Electrical characterization of photo-oxidized Si1−x−yGexCy films
  38. Excimer UV-assisted preparation of zirconium silicate layers
  39. Growth of titanium silicate thin films by photo-induced chemical vapor deposition
  40. Interface of ultrathin HfO2 films deposited by UV-photo-CVD
  41. Low temperature Si and SiGe oxidation through dielectric barrier discharges
  42. Surface modification of polyimide with excimer UV radiation at wavelength of 126 nm
  43. UV annealing of inorganic–organic composite films prepared by sol–gel technique
  44. Palladium nanoparticles on silicon by photo-reduction using 172 nm excimer UV lamps
  45. FTIR and XPS investigation of Er-doped SiO2–TiO2 films
  46. The next twenty years
  47. Photo-chemical production of gold nanoparticles in monolithic porous silica by using a novel excimer ultraviolet source
  48. High-k dielectrics by UV photo-assisted chemical vapour deposition
  49. Optical characterization of high-k dielectrics HfO 2 thin films obtained by MOCVD
  50. Characterisation of HfO2 deposited by photo-induced chemical vapour deposition
  51. Hafnium oxide layers derived by photo-assisted sol–gel processing
  52. Interface of tantalum oxide films on silicon by UV annealing at low temperature
  53. Investigation of TiO2-doped HfO2 thin films deposited by photo-CVD
  54. Rapid oxidation of silicon using 126 nm excimer radiation at low pressure
  55. Visible photoluminescence from nanocrystalline Ge grown at room temperature by photo-oxidation of SiGe using a 126 nm lamp
  56. X-ray diffraction and electrical characterization of photo-CVD zirconium oxide layers
  57. ZrO2 films deposited by photo-CVD at low temperatures
  58. Optical and structural properties of encapsulated Si nanocrystals formed in SiO2 by ion implantation
  59. Nanocrystalline TiO2 films studied by optical, XRD and FTIR spectroscopy
  60. Structural and electrical characteristics of zirconium oxide layers derived by photo-assisted sol-gel processing
  61. (Ta2O5)1−x(TiO2)x deposited by photo-induced CVD using 222 nm excimer lamps
  62. Characterisation of TiO2 deposited by photo-induced chemical vapour deposition
  63. Comparative tensile strength study of the adhesion improvement of PTFE by UV photon assisted surface processing
  64. Formation of stable zirconium oxide on silicon by photo-assisted sol–gel processing
  65. Photodegradation of polycarbonate under narrow band irradiation at 172 nm
  66. Rapid photo-oxidation of silicon at room temperature using 126 nm vacuum ultraviolet radiation
  67. Structural and electrical properties of tantalum oxide films grown by photo-assisted pulsed laser deposition
  68. UV annealing of ultrathin tantalum oxide films
  69. UV curing of optical fibre coatings using excimer lamps
  70. X-ray photoelectron spectroscopy investigations of ultrathin layers grown by ultraviolet-assisted oxidation of SiGe
  71. Characteristic photoluminescence properties of Si nanocrystals in SiO2 fabricated by ion implantation and annealing
  72. Photo-induced growth of dielectrics with excimer lamps
  73. Characterisation of ultraviolet annealed tantalum oxide films deposited by photo-CVD using 172nm excimer lamp
  74. Formation of silicon dioxide layers during UV annealing of tantalum pentoxide film
  75. High-intensity sources of incoherent UV and VUV excimer radiation for low-temperature materials processing
  76. Lifetime investigation of excimer UV sources
  77. Photo-deposition of tantalum pentoxide film using 222 nm excimer lamps
  78. Photo-induced preparation of (Ta2O5)1−x(TiO2)x dielectric thin films using sol–gel processing with xenon excimer lamps
  79. Thin tantalum and tantalum oxide films grown by pulsed laser deposition
  80. Ultrathin silicon dioxide films grown by photo-oxidation of silicon using 172 nm excimer lamps
  81. The effect of pulse duration and oxygen partial pressure on La0.7Sr0.3CoO3−δ and La0.7Sr0.3Co0.2Fe0.8O3−δ films prepared by laser ablation
  82. Low dielectric constant porous silica films formed by photo-induced sol–gel processing
  83. Deposition and annealing of tantalum pentoxide films using 172 nm excimer lamp
  84. Ultraviolet annealing of thin films grown by pulsed laser deposition
  85. Ultraviolet annealing of tantalum oxide films grown by photo-induced chemical vapour deposition
  86. Characteristics of tantalum pentoxide dielectric films deposited on silicon by excimer-lamp assisted photo-induced CVD using an injection liquid source
  87. Mechanism of photoluminescence of Si nanocrystals in SiO2fabricated by ion implantation: the role of interactions of nanocrystals and oxygen
  88. Excimer lamp-induced decomposition of platinum acetylacetonate films for electroless copper plating
  89. Incongruent transfer related to surface segregation in pulsed-laser-deposited La–Ca–Mn–O films
  90. Characteristics of high quality tantalum oxide films deposited by photoinduced chemical vapor deposition
  91. Mechanisms of droplet formation in pulsed laser growth of thin oxide films
  92. Microstructure of hydroxyapatite thin layers grown by pulsed laser deposition
  93. Decomposition mechanisms of thin palladium acetate film with excimer UV radiation
  94. Energy-dispersive mass spectrometry of high energy ions generated during KrF excimer and frequency-doubled Nd:YAG laser ablation of metals
  95. Kinetic energy distributions of ions ejected during laser ablation of lead zirconate titanate and their correlation to deposition of ferroelectric thin films
  96. Pulsed laser deposition of novel materials for thin film solid oxide fuel cell applications: Ce 0.9 Gd 0.1 O 1.95 , La 0.7 Sr 0.3 CoO y and La 0.7 Sr 0.3 Co 0.2 Fe 0.8 O y
  97. Pulsed-laser deposited ZnO for device applications
  98. Evolution of the morphology of annealed, bulk mgo (100) substrate surfaces
  99. Thin film growth by pulsed laser deposition
  100. Energy-dispersive mass spectrometry of high energy ions generated during KrF excimer and frequency-doubled Nd:YAG laser ablation of metals
  101. SEM observations of YBCO on as-received and heat-treated MgO substrates
  102. Characterisation of ionic species generated during ablation of Bi2Sr2Ca2Cu3O10 by frequency-doubled Nd:YAG laser irradiation
  103. Effects of laser wavelength and fluence on the growth of ZnO thin films by pulsed laser deposition
  104. Low temperature synthesis of Ge nanocrystals in SiO2
  105. Characteristics of high quality ZnO thin films deposited by pulsed laser deposition
  106. Rapid photochemical deposition of silicon dioxide films using an excimer lamp
  107. Fluorine enhanced oxidation of silicon at low temperatures
  108. Growth rate enhancement using ozone during rapid thermal oxidation of silicon
  109. Rapid photo-deposition of silicon dioxide films using 172 nm VUV light
  110. Microstructure of oxidized layers formed by the low‐temperature ultraviolet‐assisted dry oxidation of strained Si0.8Ge0.2layers on Si
  111. Growth and modeling of cw‐UV induced oxidation of silicon
  112. Synthesis of (BiPb)2Sr2Ca2Cu3O10superconducting thin films on MgO using a multilayered pulsed laser deposition method
  113. Ozone‐induced rapid low temperature oxidation of silicon
  114. Low pressure photodeposition of silicon nitride films using a xenon excimer lamp
  115. Guest editorial
  116. Formation of (Ca1−xSrx)2PbO4in Bi(Pb)‐Sr‐Ca‐Cu‐O system: Correlation with the formation of the 2223 high‐Tcphase
  117. Microstructure And Patterning Of Laser Initiated Oxide Growth
  118. In situ monitoring of laser-induced silicon oxidation
  119. Recent advances in laser processing of microelectronic materials and devices
  120. Photoformation of dielectrics
  121. Dual-wavelength temperature measurement of laser-heated silicon
  122. Materials Research Support in United Kingdom Undergoes Review
  123. Silicon‐silicon dioxide interface: An infrared study
  124. Photon‐controlled oxidation of silicon
  125. Deconvolution of the infrared absorption peak of the vibrational stretching mode of silicon dioxide: Evidence for structural order?
  126. Up Close: University College London Department of Electronic and Electrical Engineering
  127. Structure of ultrathin silicon dioxide films
  128. Laser-Induced Deposition
  129. Structural changes produced in silicon by intense 1‐μm ps pulses
  130. Laser technology: Microfabrication of thin films
  131. Temporally resolved imaging of silicon surfaces melted with intense picosecond 1‐μm laser pulses
  132. Semiconductor technology: Kinetics of pulsed laser annealing
  133. Various phase transitions and changes in surface morphology of crystalline silicon induced by 4–260‐ps pulses of 1‐μm radiation
  134. Absorption of infrared radiation in silicon
  135. A review of laser beam applications for processing silicon
  136. Incorporation of carbon dioxide laser‐grown oxide layers into conventional metal‐oxide‐silicon devices
  137. Laser processing of silicon
  138. Laser‐enhanced oxidation of Si
  139. Oxidation of silicon surfaces by CO2lasers
  140. A study of thin silicon dioxide films using infrared absorption techniques
  141. A real-time visual display of a high-power laser-beam
  142. Laser annealing for semiconductor devices