All Stories

  1. Layer-by-layer NH3 plasma treatment for area-selective atomic layer deposition of high-quality SiO2 thin films

    Article • The Journal of Chemical Physics, March 2025, American Institute of Physics

    Professor Hyungjun Kim

  2. Role of a cyclopentadienyl ligand in a heteroleptic alkoxide precursor in atomic layer deposition

    Article • The Journal of Chemical Physics, January 2024, American Institute of Physics

    Professor Hyungjun Kim, Dr Taek-Mo Chung

  3. Layer-modulated synthesis of uniform tungsten disulfide nanosheet using gas-phase precursors

    Article • Nanoscale, January 2015, Royal Society of Chemistry

    Professor Hyungjun Kim

  4. In situ surface cleaning on a Ge substrate using TMA and MgCp2for HfO2-based gate oxides

    Article • Journal of Materials Chemistry C, January 2015, Royal Society of Chemistry

    Professor Hyungjun Kim

  5. Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process

    Article • Journal of Materials Chemistry C, January 2014, Royal Society of Chemistry

    Professor Hyungjun Kim