All Stories

  1. ADI to in-cell overlay stability improvement for DRAM using novel scatterometry and comprehensive process control

    Article • April 2023, SPIE

    Product Marketing Manager Hedvi Spielberg

  2. Enhancement of overlay metrology accuracy by multi-wavelength scatterometry with rotated quadrupole illumination

    Article • April 2023, SPIE

    Product Marketing Manager Hedvi Spielberg

  3. Residuals reduction in imaging-based overlay using color per layer

    Article • April 2023, SPIE

    Product Marketing Manager Hedvi Spielberg

  4. Spectral analysis overlay measurement approach for improvement of overlay accuracy in advanced integrated circuits

    Article • May 2022, SPIE

    Product Marketing Manager Hedvi Spielberg

  5. Overlay stability control in IBO measurement using rAIM target

    Article • May 2022, SPIE

    Product Marketing Manager Hedvi Spielberg

  6. Statistical process optimization method for metrology equipment

    Article • February 2021, SPIE

    Product Marketing Manager Hedvi Spielberg

  7. Moiré effect-based Overlay target design for OPO improvements

    Article • February 2021, SPIE

    Product Marketing Manager Hedvi Spielberg

  8. Improved device overlay by litho aberration tracking with novel target design for DRAM

    Article • March 2020, SPIE

    Product Marketing Manager Hedvi Spielberg

  9. Process variation monitoring (PVM) by wafer inspection tool as a complementary method to CD-SEM for mapping field CDU on advanced production devices

    Article • March 2010, SPIE

    Product Marketing Manager Hedvi Spielberg