All Stories

  1. Effect of Surface Etching Conditions on Stacking Faults in 4H-SiC Epitaxy
  2. Impact of Subsurface Damage on SiC Wafer Shape
  3. Influence of Dopant Concentration on Dislocation Distributions in 150mm 4H SiC Wafers
  4. Optimization of 150 mm 4H SiC Substrate Crystal Quality
  5. Resolving the Discrepancy between Observed and Calculated Penetration Depths in Grazing Incidence X-Ray Topography of 4H-SiC Wafers
  6. Large Area 4H SiC Products for Power Electronic Devices
  7. Homoepitaxial Chemical Vapor Deposition of up to 150 μm Thick 4H-SiC Epilayers in a 10×100 mm Batch Reactor
  8. Synchrotron X-Ray Topography Analysis of Double Shockley Stacking Faults in 4H-SiC Wafers
  9. Studies of the Origins of Half Loop Arrays and Interfacial Dislocations Observed in Homoepitaxial Layers of 4H-SiC
  10. Stacking Fault Formation via 2D Nucleation in PVT Grown 4H-SiC