All Stories

  1. Controlled solvent vapor annealing of a high χ block copolymer thin film
  2. Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application
  3. Morphological evolution of lamellar forming polystyrene-block-poly(4-vinylpyridine) copolymers under solvent annealing
  4. Parallel Arrays of Sub-10 nm Aligned Germanium Nanofins from an In Situ Metal Oxide Hardmask using Directed Self-Assembly of Block Copolymers
  5. Solvent Vapor Annealing of Block Copolymers in Confined Topographies: Commensurability Considerations for Nanolithography
  6. Nanoscale neuroelectrode modification via sub-20 nm silicon nanowires through self-assembly of block copolymers
  7. Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer
  8. Study of the Kinetics and Mechanism of Rapid Self-Assembly in Block Copolymer Thin Films during Solvo-Microwave Annealing
  9. Selective etching of polylactic acid in poly(styrene)-block-poly(d,l)lactide diblock copolymer for nanoscale patterning
  10. Formation of sub-7 nm feature size PS-b-P4VP block copolymer structures by solvent vapour process
  11. Self-assembly of polystyrene-block-poly(4-vinylpyridine) block copolymer on molecularly functionalized silicon substrates: fabrication of inorganic nanostructured etchmask for lithographic use