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  1. Effect of Pulse Duration on Plasma Chemistry and Growth of TiN Films via HIPIMS

    Article • Journal of Applied Physics, September 2025, American Institute of Physics

    Arutiun P. Ehiasarian

  2. TiAlCN/VCN nanolayer coatings suitable for machining of Al and Ti alloys deposited by combined high power impulse magnetron sputtering/unbalanced magnetron sputtering

    Article • Surface Engineering, November 2010, Taylor & Francis

    Arutiun P. Ehiasarian