All Stories

  1. Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching
  2. A Global Model Study of Plasma Chemistry and Propulsion Parameters of a Gridded Ion Thruster Using Argon as Propellant
  3. Effect of a diamond-like carbon film on the mechanical and surface properties of microwave-cured polymethylmethacrylate
  4. Control and data acquisition system to study dielectric breakdown in low-pressure DC plasma reactor with parallels electrodes
  5. Structural, Morphological, Vibrational and Optical Properties of GaN Films Grown by Reactive Sputtering: The Effect of RF Power at Low Working Pressure Limit
  6. Antimicrobial Effect of Plasma-Activated Tap Water on Staphylococcus aureus, Escherichia coli, and Candida albicans
  7. Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
  8. Study of aluminum nitride films deposited on silicon for fabrication of MEMs devices
  9. A global model study of argon plasma chemistry used as propellant of a gridded ion thruster
  10. SiOx Top Layer on DLC Films for Atomic Oxygen and Ozone Corrosion Protection in Aerospace Applications
  11. Secondary ion mass spectrometry and atomic force microscopy analysis of silver-doped diamond-like carbon films on titanium alloy (Ti6Al4V) for possible biomedical application
  12. Physicochemical Studies on the Surface of Polyamide 6.6 Fabrics Functionalized by DBD Plasmas Operated at Atmospheric and Sub-Atmospheric Pressures
  13. Effect of Ozone Exposure on Water Uptake and Germination of Lentil (Lens Culinaris) Seeds
  14. Black TiO2 Thin Films Production Using Hollow Cathode Hydrogen Plasma Treatment: Synthesis, Material Characteristics and Photocatalytic Activity
  15. Effect of DLC Films with and without Silver Nanoparticles Deposited On Titanium Alloy
  16. Plasmas and Processes of Materials
  17. Diamond-like carbon films over reconstructive TMJ prosthetic materials: Effects in the cytotoxicity, chemical and mechanical properties
  18. The Effect of Plasma Nitriding on the Fatigue Behavior of the Ti-6Al-4V Alloy
  19. Effect of Plasma Nitriding on Fatigue Behavior of Ti-6Al-4V Alloy
  20. Plasma nanotexturing of amorphous carbon films by reactive ion etching
  21. Effect of Plasma Nitriding on the Creep and Tensile Properties of the Ti-6Al-4V Alloy
  22. Correction to: Plasma processed carbon thin films applied to dye-sensitized solar cells
  23. Plasma processed carbon thin films applied to dye-sensitized solar cells
  24. O2 plasma sintering study of TiO2 photoelectrodes in dye solar cells
  25. The influence of aluminum incorporation on the structural and electrical properties of ZnO thin films for applications in piezoresistive sensors
  26. Antimicrobial and anti-biofilm properties of polypropylene meshes coated with metal-containing DLC thin films
  27. Creep behavior evaluation and characterization of SiC film with Cr interlayer deposited by HiPIMS in Ti-6Al-4V alloy
  28. Numeric Model for Assessment of Naphthalene Conversion through Ionization Reactions in a Microwave Air Plasma Torch
  29. Diffusion of silicon in titanium dioxide thin films with different degree of crystallinity: Efficiency of TiO2 and TiN barrier layers
  30. Growth and surface characterization of FeAlCr thin films deposited by magnetron sputtering for biomedical applications
  31. Abutment Coating With Diamond-Like Carbon Films to Reduce Implant–Abutment Bacterial Leakage
  32. Optical, electrical and electrochemical evaluation of sputtered platinum counter electrodes for dye sensitized solar cells
  33. Microwave Air Plasma Applied to Naphthalene Thermal Conversion
  34. Tribomechanical and structural properties of a-SiC:H films deposited using liquid precursors on titanium alloy
  35. Coating Dental Implant Abutment Screws with Diamondlike Carbon Doped with Diamond Nanoparticles: The Effect on Maintaining Torque After Mechanical Cycling
  36. Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS
  37. Effect of metal target power on the properties of co-sputtered Sn-DLC and W-DLC thin films
  38. Electrical Conduction Mechanisms in Metal–Insulator–Metal (MIM) Structure with TiO x N y Thin Films Deposited with Different O/N Ratios
  39. Evaluation of piezoresistivity properties of sputtered ZnO thin films
  40. Optical Characterization of Glow and Afterglow Regions of Ar/O2Microwave Plasma: Effect of Applied Power and Gas Flow
  41. Characterization of SiC thin films deposited by HiPIMS
  42. Hysteresis-free deposition of TiOxNy thin films: Effect of the reactive gas mixture and oxidation of the TiN layers on process control
  43. Development of Dye-Sensitized Solar Cells with Sputtered N-DopedTiO2Thin Films: From Modeling the Growth Mechanism of the Films to Fabrication of the Solar Cells
  44. Electrical and Structural Characterization of Sn-DLC Thin Films for Piezoresistive Sensors
  45. Influence of gas and treatment time on the surface modification of EPDM rubber treated at afterglow microwave plasmas
  46. Si-based thin film coating on Y-TZP: Influence of deposition parameters on adhesion of resin cement
  47. High quality TiO2 deposited by reactive sputtering. Structural and electrical peculiarities influenced by the specific experimental conditions
  48. Fabrication of dye-sensitized solar cells with N-doped TiO2 thin films: Effect of the nitrogen doping on the photoexcitation processes and generation of electron acceptor states
  49. Effect of Diamond-Like Carbon Thin Film Coated Acrylic Resin onCandida albicansBiofilm Formation
  50. Modeling the reactive sputter deposition of N-doped TiO2 for application in dye-sensitized solar cells: Effect of the O2 flow rate on the substitutional N concentration
  51. Automation of a Mass Flow Controller for Application in Time-Multiplex SF6+CH4Plasma Etching of Silicon
  52. Amorphous Silicon Carbide Thin Films Deposited by Magnetron Co-Sputtering: Effect of Applied Power and Deposition Pressure on Film Characteristics
  53. Tuning the properties of SiC films by dual magnetron sputtering
  54. Chemical bonds, electrical resistivity and hardness of argon-incorporated SiC films
  55. Effect of nitrogen content in amorphous SiCxNyOz thin films deposited by low temperature reactive magnetron co-sputtering technique
  56. Comparison between conventional and hollow cathode magnetron sputtering systems on the growing of titanium dioxide thin films: a correlation between the gas discharge and film formation
  57. Control of the substrate temperature using a triode magnetron sputtering system
  58. Surface modification of EPDM rubber by microwave excited plasmas
  59. Influence of the Nitrogen Concentration on the Photoinduced Hydrophilicity of N-doped Titanium Dioxide Thin Films Deposited by Plasma Sputtering
  60. Titanium dioxide thin films deposition by direct current hollow cathode magnetron sputtering
  61. Influence of Electronegative Gas on the Efficiency of Conventional and Hollow Cathode Magnetron Sputtering Systems
  62. Effect of gas residence time on the morphology of silicon surface etched in SF6 plasmas
  63. Role of the Temperature on the Interaction Mechanisms Between Argon–Oxygen Post-Discharge and Hexatriacontane
  64. Surface improvement of EPDM rubber by plasma treatment
  65. Off-axis growth of AlN thin films by hollow cathode magnetron sputtering under various nitrogen concentrations
  66. Surface modification of EPDM in r.f. plasma: process optimization and surface characterization
  67. Effect of the Substrate Heating Due to the Sputtering Process on the Crystallinity of TiO2 Thin Films
  68. Study of residual gas formed during plasma debinding of powder injection moulded parts
  69. A study of defects in ultra-thin transparent coatings on polymers