All Stories

  1. Electropolymerized Polyaniline on Sputtered TiO₂ Thin Films: Visible-NIR Optical Extension and Interfacial Electrochemical Activation of Compact Hybrid Electrodes
  2. Energy-constrained equivalent-circuit modeling of an atmospheric-pressure DBD plasma jet in the streamer regime
  3. Efficacy of Ozonated Sunflower Oil on the Periodontal Status of Brazilian Air Force Recruits: A Randomized Controlled Clinical Trial
  4. Tuning Optical and Photoelectrochemical Properties of TiO2/WOx Heterostructures by Reactive Sputtering: Thickness-Dependent Insights
  5. Controlling Surface-Enhanced Raman Scattering and Metal-Enhanced Fluorescence in Silver Nanofilms Using Ultrathin Aluminum Oxide Spacers via Atomic Layer Deposition
  6. Analysis of Deep Learning Techniques for Vehicle Detection and Reidentification Using Data from Multiple Drones and Public Datasets
  7. Impact of Diamond-like Carbon Films on Reverse Torque: Superior Performance in Implant Abutments with Internal Conical Connections
  8. Plasma-Activated Tap Water by Gliding Arc Discharge Through Bubbles Using an Inverted Reactor Approach
  9. Exploring TMA and H2O Flow Rate Effects on Al2O3 Thin Film Deposition by Thermal ALD: Insights from Zero-Dimensional Modeling
  10. Size-Dependent High-Pressure Behavior of Pure and Eu3+-Doped Y2O3 Nanoparticles: Insights from Experimental and Theoretical Investigations
  11. Use of silicon or carbonitriding interface in the adhesion of Ag-DLC film on titanium alloy: a comparative study
  12. Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al2O3 Film Growth
  13. Tailoring Black TiO2 Thin Films: Insights from Hollow Cathode Hydrogen Plasma Treatment Duration
  14. Identification of Self-Buffer Layer on GaN/glass Films Grown by Reactive Sputtering
  15. Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching
  16. A Global Model Study of Plasma Chemistry and Propulsion Parameters of a Gridded Ion Thruster Using Argon as Propellant
  17. Effect of a diamond-like carbon film on the mechanical and surface properties of microwave-cured polymethylmethacrylate
  18. Control and data acquisition system to study dielectric breakdown in low-pressure DC plasma reactor with parallels electrodes
  19. Control and data acquisition system to study dielectric breakdown in low-pressure DC plasma reactor with parallels electrodes
  20. Structural, Morphological, Vibrational and Optical Properties of GaN Films Grown by Reactive Sputtering: The Effect of RF Power at Low Working Pressure Limit
  21. Antimicrobial Effect of Plasma-Activated Tap Water on Staphylococcus aureus, Escherichia coli, and Candida albicans
  22. Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
  23. Study of aluminum nitride films deposited on silicon for fabrication of MEMs devices
  24. A global model study of argon plasma chemistry used as propellant of a gridded ion thruster
  25. SiOx Top Layer on DLC Films for Atomic Oxygen and Ozone Corrosion Protection in Aerospace Applications
  26. Secondary ion mass spectrometry and atomic force microscopy analysis of silver-doped diamond-like carbon films on titanium alloy (Ti6Al4V) for possible biomedical application
  27. Physicochemical Studies on the Surface of Polyamide 6.6 Fabrics Functionalized by DBD Plasmas Operated at Atmospheric and Sub-Atmospheric Pressures
  28. Effect of Ozone Exposure on Water Uptake and Germination of Lentil (Lens Culinaris) Seeds
  29. Black TiO2 Thin Films Production Using Hollow Cathode Hydrogen Plasma Treatment: Synthesis, Material Characteristics and Photocatalytic Activity
  30. Effect of DLC Films with and without Silver Nanoparticles Deposited On Titanium Alloy
  31. Plasmas and Processes of Materials
  32. Diamond-like carbon films over reconstructive TMJ prosthetic materials: Effects in the cytotoxicity, chemical and mechanical properties
  33. The Effect of Plasma Nitriding on the Fatigue Behavior of the Ti-6Al-4V Alloy
  34. Effect of Plasma Nitriding on Fatigue Behavior of Ti-6Al-4V Alloy
  35. Plasma nanotexturing of amorphous carbon films by reactive ion etching
  36. Effect of Plasma Nitriding on the Creep and Tensile Properties of the Ti-6Al-4V Alloy
  37. Correction to: Plasma processed carbon thin films applied to dye-sensitized solar cells
  38. Plasma processed carbon thin films applied to dye-sensitized solar cells
  39. O2 plasma sintering study of TiO2 photoelectrodes in dye solar cells
  40. The influence of aluminum incorporation on the structural and electrical properties of ZnO thin films for applications in piezoresistive sensors
  41. Antimicrobial and anti-biofilm properties of polypropylene meshes coated with metal-containing DLC thin films
  42. Creep behavior evaluation and characterization of SiC film with Cr interlayer deposited by HiPIMS in Ti-6Al-4V alloy
  43. Numeric Model for Assessment of Naphthalene Conversion through Ionization Reactions in a Microwave Air Plasma Torch
  44. Diffusion of silicon in titanium dioxide thin films with different degree of crystallinity: Efficiency of TiO2 and TiN barrier layers
  45. Growth and surface characterization of FeAlCr thin films deposited by magnetron sputtering for biomedical applications
  46. Abutment Coating With Diamond-Like Carbon Films to Reduce Implant–Abutment Bacterial Leakage
  47. Optical, electrical and electrochemical evaluation of sputtered platinum counter electrodes for dye sensitized solar cells
  48. Microwave Air Plasma Applied to Naphthalene Thermal Conversion
  49. Tribomechanical and structural properties of a-SiC:H films deposited using liquid precursors on titanium alloy
  50. Coating Dental Implant Abutment Screws with Diamondlike Carbon Doped with Diamond Nanoparticles: The Effect on Maintaining Torque After Mechanical Cycling
  51. Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS
  52. Effect of metal target power on the properties of co-sputtered Sn-DLC and W-DLC thin films
  53. Electrical Conduction Mechanisms in Metal–Insulator–Metal (MIM) Structure with TiO x N y Thin Films Deposited with Different O/N Ratios
  54. Evaluation of piezoresistivity properties of sputtered ZnO thin films
  55. Optical Characterization of Glow and Afterglow Regions of Ar/O2Microwave Plasma: Effect of Applied Power and Gas Flow
  56. Characterization of SiC thin films deposited by HiPIMS
  57. Hysteresis-free deposition of TiOxNy thin films: Effect of the reactive gas mixture and oxidation of the TiN layers on process control
  58. Development of Dye-Sensitized Solar Cells with Sputtered N-DopedTiO2Thin Films: From Modeling the Growth Mechanism of the Films to Fabrication of the Solar Cells
  59. Electrical and Structural Characterization of Sn-DLC Thin Films for Piezoresistive Sensors
  60. Influence of gas and treatment time on the surface modification of EPDM rubber treated at afterglow microwave plasmas
  61. Si-based thin film coating on Y-TZP: Influence of deposition parameters on adhesion of resin cement
  62. High quality TiO2 deposited by reactive sputtering. Structural and electrical peculiarities influenced by the specific experimental conditions
  63. Fabrication of dye-sensitized solar cells with N-doped TiO2 thin films: Effect of the nitrogen doping on the photoexcitation processes and generation of electron acceptor states
  64. Effect of Diamond-Like Carbon Thin Film Coated Acrylic Resin onCandida albicansBiofilm Formation
  65. Modeling the reactive sputter deposition of N-doped TiO2 for application in dye-sensitized solar cells: Effect of the O2 flow rate on the substitutional N concentration
  66. Automation of a Mass Flow Controller for Application in Time-Multiplex SF6+CH4Plasma Etching of Silicon
  67. Amorphous Silicon Carbide Thin Films Deposited by Magnetron Co-Sputtering: Effect of Applied Power and Deposition Pressure on Film Characteristics
  68. Tuning the properties of SiC films by dual magnetron sputtering
  69. Chemical bonds, electrical resistivity and hardness of argon-incorporated SiC films
  70. Effect of nitrogen content in amorphous SiCxNyOz thin films deposited by low temperature reactive magnetron co-sputtering technique
  71. Comparison between conventional and hollow cathode magnetron sputtering systems on the growing of titanium dioxide thin films: a correlation between the gas discharge and film formation
  72. Control of the substrate temperature using a triode magnetron sputtering system
  73. Surface modification of EPDM rubber by microwave excited plasmas
  74. Influence of the Nitrogen Concentration on the Photoinduced Hydrophilicity of N-doped Titanium Dioxide Thin Films Deposited by Plasma Sputtering
  75. Titanium dioxide thin films deposition by direct current hollow cathode magnetron sputtering
  76. Influence of Electronegative Gas on the Efficiency of Conventional and Hollow Cathode Magnetron Sputtering Systems
  77. Effect of gas residence time on the morphology of silicon surface etched in SF6 plasmas
  78. Role of the Temperature on the Interaction Mechanisms Between Argon–Oxygen Post-Discharge and Hexatriacontane
  79. Surface improvement of EPDM rubber by plasma treatment
  80. Off-axis growth of AlN thin films by hollow cathode magnetron sputtering under various nitrogen concentrations
  81. Surface modification of EPDM in r.f. plasma: process optimization and surface characterization
  82. Effect of the Substrate Heating Due to the Sputtering Process on the Crystallinity of TiO2 Thin Films
  83. Study of residual gas formed during plasma debinding of powder injection moulded parts
  84. A study of defects in ultra-thin transparent coatings on polymers