All Stories

  1. Magnetic field induced exciton spin dynamics in indirect band gap (In,Al)As/AlAs quantum dots
  2. Change in the InSb nanocrystal growth direction at the Si/SiO2 interface during ion-beam synthesis
  3. Influence of substrate nitridation conditions and buffer layer structures on the crack-free GaN layers on silicon substrate grown by ammonia-assisted molecular beam epitaxy
  4. Ion-Beam Synthesis of Structure-Oriented Iron Nanoparticles in Single-Crystalline Rutile TiO2
  5. Dislocation Filter Based on LT-GaAs Layers for Monolithic GaAs/Si Integration
  6. The Nature of Ferromagnetism in a System of Self-Ordered α-FeSi2 Nanorods on a Si(111)-4° Vicinal Surface: Experiment and Theory
  7. Spin dynamics of charged excitons in ultrathin (In,Al)(Sb,As)/AlAs and Al(Sb,As)/AlAs quantum wells with an indirect band gap
  8. Al2O3/InGaAs interface passivation by fluorine-containing anodic layers
  9. Si-based light emitters synthesized with Ge+ ion bombardment
  10. Blister suppression in the CO+ molecule implanted SOI substrates with ultrathin buried oxides
  11. Transformation of the InP(001) surface upon annealing in an arsenic flux
  12. Effect of the structure and the phase composition on the mechanical properties of Al–Cu–Li alloy laser welds
  13. Resistive switching on individual V2O5nanoparticles encapsulated in fluorinated graphene films
  14. Selective MOCVD synthesis of VO2 crystals on nanosharp Si structures
  15. Recombination and spin dynamics of excitons in thin (Ga,Al)(Sb,As)/AlAs quantum wells with an indirect band gap and type-I band alignment
  16. Effect of Sn for the dislocation-free SiSn nanostructure formation on the vapor-liquid-crystal mechanism
  17. Resistive Switching Effect with ON/OFF Current Relation up to 10 9 in 2D Printed Composite Films of Fluorinated Graphene with V 2 O 5 Nanoparticles
  18. An Influence of the Si(111)3-4o Vicinal Surface on the Solid Phase Epitaxy of α-FeSi2 Nanorods and their Crystal Parameters
  19. Silicide phase formation by Mg deposition on amorphous Si. Ab initio calculations, growth process and thermal stability
  20. Thermoelectric Properties of Nanostructured Material Based on Si and GaSb
  21. On the structure and photoluminescence of dislocations in silicon
  22. Heterostructures with diffused interfaces: Luminescent technique for ascertainment of band alignment type
  23. A room-temperature-operated Si LED with β-FeSi2 nanocrystals in the active layer: μW emission power at 1.5 μm
  24. Self-assembled strained GeSiSn nanoscale structures grown by MBE on Si(100)
  25. Unexpected travel of Lomer-type dislocations in Ge/Ge x Si 1-x /Si(001) heterostructures
  26. Experimental observation of the dislocation walls in heterostructures with two interfaces: Ge/Ge0.5Si0.510 nm/Si(001) as an example
  27. Apoptosis-mediated endothelial toxicity but not direct calcification or functional changes in anti-calcification proteins defines pathogenic effects of calcium phosphate bions
  28. Quantum dots formed in InSb/AlAs and AlSb/AlAs heterostructures
  29. Influence of the additional p+ doped layers on the properties of AlGaAs/InGaAs/AlGaAs heterostructures for high power SHF transistors
  30. Surface-enhanced Raman spectroscopy of semiconductor nanostructures
  31. InAsSb on GaAs (001): influence of the arsenic molecules form on composition and crystalline properties of MBE layers
  32. InAs-based metal-oxide-semiconductor structure formation in low-energy Townsend discharge
  33. Enhancement of the Si p-n diode NIR photoresponse by embedding β-FeSi2 nanocrystallites
  34. Ferromagnetic HfO2/Si/GaAs interface for spin-polarimetry applications
  35. Hemozoin “knobs” in Opisthorchis felineus infected liver
  36. Peculiarities of structure, morphology, and electrochemistry of the doped 5-V spinel cathode materials LiNi0.5-x Mn1.5-y M x+y O4 (M = Co, Cr, Ti; x+y = 0.05) prepared by mechanochemical way
  37. Linear chains of Ge/Si quantum dots grown on a prepatterned surface formed by ion irradiation
  38. The convenient preparation of stable aryl-coated zerovalent iron nanoparticles
  39. Electroluminescent 1.5-μm light-emitting diodes based on p +-Si/NC β-FeSi2/n-Si structures
  40. Role of edge dislocations in plastic relaxation of GeSi/Si(001) heterostructures: Dependence of introduction mechanisms on film thickness
  41. Raman, AFM, and TEM profiling of QD multilayer structures
  42. High-quality single-crystal diamond-graphite-diamond membranes and devices
  43. Formation of Mg silicides on amorphous Si. Origin and role of high pressure in the film growth
  44. Oxide-free InAs(111)A interface in metal-oxide-semiconductor structure with very low density of states prepared by anodic oxidation
  45. Synthesis and Characterization of CuxS (x = 1–2) Nanocrystals Formed by the Langmuir–Blodgett Technique
  46. Structure and Optical Properties of Ca Silicide Films and Si/Ca3Si4/Si(111) Heterostructures
  47. Coexistence of type-I and type-II band alignment in Ga(Sb, P)/GaP heterostructures with pseudomorphic self-assembled quantum dots
  48. Specific features of plastic relaxation of a metastable Ge x Si1 − x layer buried between a silicon substrate and a relaxed germanium layer
  49. Brief observe on iron silicide growth on amorphous silicon
  50. Electroluminescence properties of p-Si/β-FeSi2NCs/…/n-Si mesa diodes with embedded multilayers ofβ-FeSi2nanocrystallites
  51. LiVPO4F/Li3V2(PO4)3 nanostructured composite cathode materials prepared via mechanochemical way
  52. The Mechanism of {113} Defect Formation in Silicon: Clustering of Interstitial–Vacancy Pairs Studied by In Situ High-Resolution Electron Microscope Irradiation
  53. Dislocation interaction of layers in the Ge/Ge-seed/GexSi1−x/Si(001) (x∼0.3–0.5) system: Trapping of misfit dislocations on the Ge-seed/GeSi interface
  54. CdZnS quantum dots formed by the Langmuir–Blodgett technique
  55. High-precision nanoscale length measurement
  56. Magnetic field-induced dissipation-free state in superconducting nanostructures
  57. Dual threshold diode based on the superconductor-to-insulator transition in ultrathin TiN films
  58. Mechanism of induced nucleation of misfit dislocations in the Ge-on-Si(001) system and its role in the formation of the core structure of edge misfit dislocations
  59. Non-linear conduction in the critical region of the superconductor-insulator transition in TiN thin films
  60. New system of self-assembled GaSb/GaP quantum dots
  61. Formation of iron and iron silicides on silicon and iron surfaces. Role of the deposition rate and volumetric effects
  62. Crystallization of Amorphous Si Nanoclusters in SiOx Films Using Femtosecond Laser Pulse Annealings
  63. Atomic structure and energy spectrum of Ga(As,P)/GaP heterostructures
  64. Evolution of silicon nanoclusters and hydrogen in SiNx:H films: Influence of high hydrostatic pressure under annealing
  65. Novel self-assembled quantum dots in the GaSb/AlAs heterosystem
  66. Preparation of thin films of platinum group metals by pulsed MOCVD. I. Deposition of Ir layers
  67. Preparation of thin films of platinum group metals by pulsed MOCVD. II. Deposition of Ru layers
  68. Influence of shape of GaN/AlN quantum dots on luminescence decay law
  69. Structural state of Ge/Si heterosystems with (001), (111), and (7 7 10) interfaces
  70. Decomposition of a supersaturated solid solution of Fe in GaAs
  71. Ge and GexSi1−x islands formation on GexSi1−x solid solution surface
  72. Edge misfit dislocations in the GeSi/Si(001) pair: Conditions and specific features of high-quantity generation
  73. Initial stage growth of GexSi1−x layers and Ge quantum dot formation on GexSi1−x surface by MBE
  74. High-quality structures with InAs/Al0.9Ga0.1As QDs produced by droplet epitaxy
  75. Exciton recombination dynamics in an ensemble of (In,Al)As/AlAs quantum dots with indirect band-gap and type-I band alignment
  76. Growth, structure and luminescence properties of multilayer Si/β-FeSi2NCs/Si/…/Si nanoheterostructures
  77. Spontaneous composition modulation during Cd x Hg1−x Te(301) molecular beam epitaxy
  78. Strained germanium films in Ge/InGaAs/GaAs heterostructures: Formation of edge misfit dislocations at the Ge/InGaAs interface
  79. Edge misfit dislocations in Ge x Si1 − x /Si(001) (x ∼ 1) heterostructures: role of buffer Ge y Si1 − y (y < x) interlayer in their formation
  80. On triple dislocation nodes observed by TEM in a Ge0.4Si0.6film grown on a slightly deviating (0 0 1)Si substrate
  81. Defects in the crystal structure of Cd x Hg1 − x Te layers grown on the Si (310) substrates
  82. Mechanisms of edge-dislocation formation in strained films of zinc blende and diamond cubic semiconductors epitaxially grown on (001)-oriented substrates
  83. Role of cross-slipping in formation of edge dislocations in heteroepitaxial systems GeSi-on-Si(001) and Ge-on-InGaAs/GaAs
  84. Optical property improvement of InAs/GaAs quantum dots grown by hydrogen-plasma-assisted molecular beam epitaxy
  85. Inclined misfit dislocations in a film/substrate system
  86. Nonradiative energy transfer between vertically coupled indirect and direct bandgap InAs quantum dots
  87. Specific features of formation and propagation of 60° and 90° misfit dislocations in GexSi1−x/Si films with x>0.4
  88. Initial stages of Ge epitaxy on Si(111) under quasi-equilibrium growth conditions
  89. High quality relaxed GaAs quantum dots in GaP matrix
  90. Formation of edge misfit dislocations in GexSi1−x(x∼0.4–0.8) films grown on misoriented (001)→(111) Si substrates: Features before and after film annealing
  91. Precise surface measurements at the nanoscale
  92. Heteroepitaxy of Ge x Si1 − x (x ∼ 0.4–0.5) films on Si(001) substrates misoriented to (111): Formation of short edge misfit dislocations alone in the misorientation direction
  93. 10.1007/s11700-008-1018-9
  94. 10.1007/s11453-008-1001-5
  95. Crystal perfection of GaP films grown on Si substrates by solid-source MBE with atomic hydrogen
  96. Pulsed ion-beam assisted deposition of Ge nanocrystals on SiO2 for non-volatile memory device
  97. The influence of elastic strains on the growth and properties of vertically ordered Ge “hut”-clusters
  98. Formation of misfit edge dislocations in Ge x Si1 − x films (x ∼ 0.4–0.5) grown on tilted Si(001) → (111) substrates
  99. Effect of the ion-energy loss rate on defect formation during implantation in silicon nanocrystals
  100. Atomic and energy structure of InAs/AlAs quantum dots
  101. Formation of edge misfit dislocations in GexSi1−x (x∼0.4–0.5) films grown on misoriented (001)→(111) Si substrates
  102. Features of formation and propagation of 60° and 90° misfit dislocations in GexSi1−x∕Si (x∼0.4–0.5) films caused by Si substrate misorientation from (001)
  103. Investigation of Multilayer Silicon Structures with Buried Iron Silicide Nanocrystallites: Growth, Structure, and Properties
  104. Potentialities and basic principles of controlling the plastic relaxation of GeSi/Si and Ge/Si films with stepwise variation in the composition
  105. Application of high-resolution electron microscopy for visualization and quantitative analysis of strain fields in heterostructures
  106. New Compositionally-Ordered GeSi Nano Dots Fabricated with 1250 keV Electrons
  107. Plastic relaxation of GeSi/Si(001) films grown by molecular-beam epitaxy in the presence of the Sb surfactant
  108. Formation, crystal structure, and properties of silicon with buried iron disilicide nanocrystallites on Si (100) substrates
  109. Morphological transformations of vanadium oxide films during low-temperature reduction in hydrogen electron cyclotron resonance plasma
  110. Silicon layers atop iron silicide nanoislands on Si(100) substrate: Island formation, silicon growth, morphology and structure
  111. Role of the dislocation screw component in the formation of the dislocation structure in Ge- and Si-based semiconductor heterosystems
  112. VARIATION OF IN-PLANE LATTICE CONSTANT OF Si/Ge/Si HETEROSTRUCTURES WITH Ge QUANTUM DOTS
  113. Pulsed ion-beam induced nucleation and growth of Ge nanocrystals on SiO2
  114. Structure and electrical properties of polycrystalline SiGe films grown by molecular beam deposition
  115. Narrowing of ground energy level distribution in an array of InAs/AlAs QDs by post grown annealing
  116. Sb as surfactant at plastic relaxation of GeSi/Si(001) films grown by molecular-beam epitaxy: Reduction of surface roughness value
  117. Dominating nucleation of misfit dislocations from the surface in GeSi/Si(001) films with a stepwise composition grown by means of molecular-beam epitaxy
  118. <title>Dense arrays of Ge nanoclusters induced by low-energy ion-beam assisted deposition on Si0<formula><inf><roman>2</roman></inf></formula> films</title>
  119. <title>Ge nanoclusters in GeO<formula><inf><roman>2</roman></inf></formula>: formation and optical properties</title>
  120. Strong sensitivity of photoluminescence of InAs/AlAs quantum dots to defects: evidence for lateral inter-dot transport
  121. Origination of misfit dislocations at the surface during the growth of GeSi/Si(001) films by low-temperature (300–400°C) molecular-beam epitaxy
  122. Interface phonons in semiconductor nanostructures with quantum dots
  123. Observation of antiphase domains in CdxHg1−x Te films on silicon by the phase contrast method in atomic force microscopy
  124. Ge/Si quantum dot nanostructures grown with low-energy ion beam-assisted epitaxy
  125. Heterostructures GexSi1−x/Si(001) grown by low-temperature (300–400°C) molecular beam epitaxy: Misfit dislocation propagation
  126. The formation of silicon nanocrystals in SiO2 layers by the implantation of Si ions with intermediate heat treatments
  127. Instability of the distribution of atomic steps on Si(111) upon submonolayer gold adsorption at high temperatures
  128. Effect of Quantum Confinement on Optical Properties of Ge Nanocrystals in GeO[sub 2] Films
  129. Formation of Ultrasmall Germanium Nanoislands with a High Density on an Atomically Clean Surface of Silicon Oxide
  130. Photoluminescence kinetics of wurtzite GaN quantum dots in an AlN matrix
  131. Direct observations of dislocation half-loops inserted from the surface of the GeSi heteroepitaxial film
  132. Strain relaxation of GeSi/Si(001) heterostructures grown by low-temperature molecular-beam epitaxy
  133. Heterostructures GexSi1−x/Si(001) (x=0.18–0.62) grown by molecular beam epitaxy at a low (350 °C) temperature: specific features of plastic relaxation
  134. Enhanced strain relaxation in a two-step process of GexSi1−x/Si(001) heterostructures grown by low-temperature molecular-beam epitaxy
  135. Surface morphology transitions induced by ion beam action during Ge/Si MBE
  136. MODIFICATION OF GROWTH MODE OF Ge ON Si BY PULSED LOW-ENERGY ION-BEAM IRRADIATION
  137. Formation of nanocrystalline silicon films using high-dose H+ ion implantation into silicon-on-insulator layers with subsequent rapid thermal annealing
  138. Growth and structure of Ge nanoislands on an atomically clean silicon oxide surface
  139. Optimization of the plastic relaxation of misfit stresses in GexSi1−x /Si(001) (x≤0.61) heterostructures
  140. Defects in silicon heat-treated under uniform stress and irradiated with fast neutrons
  141. Epitaxial silicon films deposited at high rates by gas-jet electron beam plasma CVD
  142. TEM study of incommensurate phases in minerals: implication for materials science
  143. InP decomposition phosphorus beam source for MBE: design, properties and superlattice growth
  144. Optical vibration modes in (Cd, Pb, Zn)S quantum dots in the Langmuir-Blodgett matrix
  145. Formation of Si nanocrystals in a-Si films using excimer laser
  146. X-ray-emission study of the structure of Si:H layers formed by low-energy hydrogen-ion implantation
  147. Plastic relaxation of solid GeSi solutions grown by molecular-beam epitaxy on the low temperature Si(100) buffer layer
  148. Influence of the misfit-dislocation screw component on the formation of threading dislocations in semiconductor heterostructures
  149. Effect of stress on defect transformation in hydrogen-implanted silicon and SOI structures
  150. Solid solutions GeSi grown by MBE on a low temperature Si (001) buffer layer: specific features of plastic relaxation
  151. In Situ HREM Irradiation Study of an Intrinsic Point Defects Clustering in FZ-Si
  152. Properties of extremely thin silicon layer in silicon-on-insulator structure formed by smart-cut technology
  153. GeSi films with reduced dislocation density grown by molecular-beam epitaxy on compliant substrates based on porous silicon
  154. Splitting and electrical properties of the SOI structure formed from the heavily boron doped silicon with using of the smart-cut technology