All Stories

  1. Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet

    Article • Journal of Micro/Nanolithography MEMS and MOEMS, August 2016, SPIE

    Alex Robinson

  2. Helium ion beam lithography on fullerene molecular resists for sub-10nm patterning

    Article • Microelectronic Engineering, April 2016, Elsevier

    Alex Robinson

  3. Performance of a high resolution chemically amplified electron beam resist at various beam energies

    Article • Microelectronic Engineering, April 2016, Elsevier

    Alex Robinson

  4. Spin-on-carbon hard masks utilising fullerene derivatives

    Article • March 2016, SPIE

    Alex Robinson

  5. Dynamic absorption coefficients of CAR and non-CAR resists at EUV

    Article • March 2016, SPIE

    Alex Robinson

  6. Optimization and sensitivity enhancement of high-resolution molecular resist for EUV lithography

    Article • March 2016, SPIE

    Alex Robinson

  7. Organic hard masks utilizing fullerene derivatives

    Article • March 2015, SPIE

    Alex Robinson

  8. Towards 11nm half-pitch resolution for a negative-tone chemically amplified molecular resist platform for extreme-ultraviolet lithography

    Article • March 2015, SPIE

    Alex Robinson

  9. Spin-on carbon using fullerene derivatives

    Article • March 2014, SPIE

    Alex Robinson

  10. Optimization of fullerene-based negative tone chemically amplified fullerene resist for extreme ultraviolet lithography

    Article • March 2014, SPIE

    Alex Robinson

  11. Chemically amplified phenolic fullerene electron beam resist

    Article • Journal of Materials Chemistry C, January 2014, Royal Society of Chemistry

    Alex Robinson

  12. Patterned self assembly of nanoparticles

    Article • Colloids and Surfaces A Physicochemical and Engineering Aspects, September 2013, Elsevier

    James Bowen, Dr James Bowen, Alex Robinson

  13. How Nanoscience Translates into Technology: The Case of Self-Assembled Monolayers, Electron-Beam Writing, and Carbon Nanomembranes

    Article • ACS Nano, August 2013, American Chemical Society (ACS)

    Alex Robinson

  14. Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography

    Article • Journal of Micro/Nanolithography MEMS and MOEMS, August 2013, SPIE

    Alex Robinson

  15. Spin-on carbon based on fullerene derivatives as hardmask materials for high-aspect-ratio etching

    Article • Journal of Micro/Nanolithography MEMS and MOEMS, July 2013, SPIE

    Alex Robinson

  16. EUV lithography performance of negative-tone chemically amplified fullerene resist

    Article • March 2013, SPIE

    Alex Robinson

  17. Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching

    Article • March 2013, SPIE

    Alex Robinson

  18. Formation of nanoscale structures by inductively coupled plasma etching

    Article • January 2013, SPIE

    Alex Robinson

  19. High aspect ratio silicon and polyimide nanopillars by combination of nanosphere lithography and intermediate mask pattern transfer

    Article • Microelectronic Engineering, November 2012, Elsevier

    Alex Robinson

  20. Fullerene-based spin-on-carbon hardmask

    Article • Microelectronic Engineering, October 2012, Elsevier

    Alex Robinson

  21. Lithography using liquid silicone polymer films

    Article • Microelectronic Engineering, September 2012, Elsevier

    James Bowen, Dr James Bowen, Alex Robinson

  22. High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask

    Article • March 2012, SPIE

    Alex Robinson

  23. Positive-tone chemically amplified fullerene resist

    Article • March 2012, SPIE

    Alex Robinson

  24. Plasma etching of high-resolution features in a fullerene molecular resist

    Article • March 2011, SPIE

    Alex Robinson

  25. Scanning probe energy loss spectroscopy with microfabricated coaxial tips

    Article • Physical Review B, April 2010, American Physical Society (APS)

    Alex Robinson

  26. Fabrication of co-axial field emitter tips for scanning probe energy loss spectroscopy

    Article • Nanotechnology, March 2010, Institute of Physics Publishing

    Alex Robinson

  27. Characterization of the effects of base additives on a fullerene chemically amplified resist

    Article • March 2010, SPIE

    Alex Robinson

  28. Direct Electron-Beam Writing of Highly Conductive Wires in Functionalized Fullerene Films

    Article • Small, December 2009, Wiley

    Alex Robinson

  29. Low activation energy fullerene molecular resist

    Article • March 2009, SPIE

    Alex Robinson

  30. Fullerene Resist Materials for the 32 nm Node and Beyond

    Article • Advanced Functional Materials, July 2008, Wiley

    Alex Robinson

  31. Anomalous acid diffusion in a triphenylene molecular resist with melamine crosslinker

    Article • Microelectronic Engineering, July 2008, Elsevier

    Alex Robinson

  32. A high resolution water soluble fullerene molecular resist for electron beam lithography

    Article • Nanotechnology, May 2008, Institute of Physics Publishing

    Alex Robinson

  33. Chemically amplified molecular resists for e-beam lithography

    Article • Microelectronic Engineering, May 2008, Elsevier

    Alex Robinson