All Stories

  1. An InGaN amber nano-light-emitting diode with external quantum efficiency of 10.1%
  2. A dual optimization strategy of nucleation layer and V/III ratio for defect suppression in a-plane gallium nitride (GaN) on r-plane sapphire
  3. The trade-off between electrical performance and structural quality in silicon (n-type) and magnesium (p-type)-doped a-plane gallium nitride (GaN) on r-plane sapphire
  4. Technological innovation system applicability in developing countries: Insights from Malaysia's gallium nitride technology development
  5. Fixed angle lifting approach: A feasible and effective coating method for preparing long range order polystyrene monolayer with controllable optical property
  6. Polarization-switchable passive harmonic mode-locking with microsecond-scale pulse envelopes in an ultralong-cavity erbium-doped fiber laser
  7. A Review of Emerging Trends of GaN Power Semiconductor Applications in Onboard Chargers
  8. Crystallinity enhancement of AlN thin films on Si via nucleation layer engineering and ceramic target sputtering
  9. Manipulation of Niobium Dopant concentrations on TiO2 nanotube arrays film via dual-steps electrochemical method for humidity sensor
  10. Effect of deposition regime transition on the properties of Al:ZnO transparent conducting oxide layer by radio frequency magnetron sputtering system
  11. Study of AlN Epitaxial Growth on Si (111) Substrate Using Pulsed Metal–Organic Chemical Vapour Deposition
  12. The Effect of AlN Epilayer Growth Rate on the Growth of Semipolar (11–22) InGaN/GaN Light Emitting Diode
  13. Impact of nucleation temperature on growth uniformity of GaN on 4-inch dome-patterned sapphire substrate
  14. Influence of argon/nitrogen sputtering gas and molybdenum/titanium seed layer on aluminium nitride ⟨100⟩ thin film growth using ceramic target
  15. Numerical study on the optimisation of AlGaN-based deep ultra-violet light emitting diodes single quantum wells
  16. Influence of Pulse Atomic-Layer Epitaxy (PALE) AlN Buffer Layer on Quality of MOCVD Grown GaN on Si(111) Substrate.
  17. Enhancement of gallium nitride on silicon (111) using pulse atomic-layer epitaxy (PALE) AlN with composition-graded AlGaN buffer
  18. The effect of ammonia partial pressure on the growth of semipolar (11–22) InGaN/GaN MQWs and LED structures
  19. Effects of argon/nitrogen sputtering gas on the microstructural, crystallographic and piezoelectric properties of AlN thin films
  20. Optical band gap and surface morphology of AlN thin-film sputtered by HiPIMS on glass substrate
  21. Rf Sputtering Growth of Zinc Oxide Nanocolumnar Current Spreading Layer for Ultraviolet Light Emitter Devices
  22. INFLUENCE OF ANATASE TITANIUM DIOXIDE NANOTUBE ARRAYS ON HUMIDITY SENSOR SYNTHESIZED BY ELECTROCHEMICAL ANODIZATION
  23. Enhancement in Structural and Electroluminescence Properties of Green Light Emission for Semipolar (11–22) InGaN/GaN Based Grown on m-Plane Sapphire via Low Temperature Ammonia Treatment (LTAT)
  24. Aluminium Thin Film Surface Modification via Low-Pressure and Atmospheric-Pressure Argon Plasma Exposure
  25. Electrical and structural comparison of (100) and (002) oriented AlN thin films deposited by RF magnetron sputtering
  26. Non-Polar Gallium Nitride for Photodetection Applications: A Systematic Review
  27. Effect of Flux Rate Variation at Fixed V/III Ratio on Semi-Polar (112¯2) GaN: Crystal Quality and Surface Morphology Study
  28. Impedance spectroscopy analysis of Al/100-plane AlN/p-Si MIS prepared by HiPIMS method for tailoring dielectric properties
  29. Magnesium doped semipolar (11–22) p-type gallium nitride: Impact of dopant concentration variants towards grain size distributions and crystalline quality
  30. Corrigendum to “Enhanced indium adsorption and surface evolution of semi-polar (11–22) LED via a strain periodic alternating superlattice (SPAS-L)” [Mater. Today Commun. 27 (2021) 102441]
  31. Luminescence and Crystalline Properties of InGaN-based LED on Si Substrate with AlN/GaN Superlattice Structure
  32. Improvement of c-axis (002) AlN crystal plane by temperature assisted HiPIMS technique
  33. Author Correction: Impact of sandwiched strain periodic multilayer AlN/GaN on strain and crystalline quality of a-plane GaN
  34. The optimization of n-type and p-type m-plane GaN grown on m-plane sapphire substrate by metal organic chemical vapor deposition
  35. Effect of nucleation layer thickness on reducing dislocation density in AlN layer for AlGaN-based UVC LED
  36. Structural and mechanical properties of a-axis AlN thin films growth using reactive RF magnetron sputtering plasma
  37. Enhanced indium adsorption and surface evolution of semi-polar (11–22) LED via a strain periodic alternating superlattice (SPAS-L)
  38. Impact of sandwiched strain periodic multilayer AlN/GaN on strain and crystalline quality of a-plane GaN
  39. Effect of indium pre-flow on wavelength shift and crystal structure of deep green light emitting diodes
  40. Impact of crystallinity towards the performance of semi-polar (11–22) GaN UV photodetector
  41. Diminishing the Induced Strain and Oxygen Incorporation on Aluminium Nitride Films Deposited Using Pulsed Atomic-Layer Epitaxy Techniques at Standard Pressure MOCVD
  42. Disilane doping of semi-polar (11-22) n-GaN: The impact of terrace-like evolution toward the enhancement of the electrical properties
  43. Improved performance of InGaN/GaN LED by optimizing the properties of the bulk and interface of ITO on p-GaN
  44. The crystallographic quality and band-edge transition of as-deposited PALE AlN films via metal organic chemical vapor deposition
  45. Synthesis of Anatase Titanium Dioxide Nanotube Arrays via Electrochemical Anodization
  46. The effect of Multi Quantum Well growth regime transition on MQW/p-GaN structure and light emitting diode (LED) performance
  47. Influence of post-ammonia annealing temperature on e-beam evaporation deposited GaN layer on patterned sapphire substrate
  48. Deposition of AlN Thin Film by High-Power Impulse Magnetron Sputtering with Tilted Sputter Target at Different Working Pressure
  49. Structural properties and surface roughness of heterostructure GaN/AlN on Si (100) substrate
  50. Characterization of Amorphous GaN Thin Films after Conventional Thermal Anneal
  51. MEH-PPV organic material as saturable absorber for Q-switching and mode-locking applications
  52. Fabrication of Deep Green Light Emitting Diode on Bulk Gallium Nitride Substrate
  53. Indium Tin Oxide Coated D-Shape Fiber as a Saturable Absorber for Generating a Dark Pulse Mode-Locked Laser*
  54. Growth of semi-polar (112¯2) GaN on m-plane sapphire via In-Situ Multiple Ammonia Treatment (I-SMAT) method
  55. Indium tin oxide coated D-shape fiber as saturable absorber for passively Q-switched erbium-doped fiber laser
  56. Crystal quality and surface structure tuning of semi-polar (11–22) GaN on m-plane sapphire via in-situ multiple ammonia treatment
  57. Mode-locked erbium-doped fiber laser via evanescent field interaction with indium tin oxide
  58. Electronic surface, optical and electrical properties of p – GaN activated via in-situ MOCVD and ex-situ thermal annealing in InGaN/GaN LED
  59. Poly(3-hexylthiophene-2,5-diyl) regioregular (P3HT) thin film as saturable absorber for passively Q-switched and mode-locked Erbium-doped fiber laser
  60. Anodization voltage effect on physical properties of anodic TiO2 nanotube arrays film
  61. Agglomeration enhancement of AlN surface diffusion fluxes on a (0 0 0 1)-sapphire substrate grown by pulsed atomic-layer epitaxy techniques via MOCVD
  62. Positioning of periodic AlN/GaN multilayers: Effect on crystalline quality of a-plane GaN
  63. Alq 3 saturable absorber for generating Q‐switched pulses in erbium‐doped fiber laser
  64. Solution-Processable Vertical Organic Light-Emitting Transistors (VOLETs) with Directly Deposited Silver Nanowires Intermediate Source Electrode
  65. Impact of a Strained Periodic Multilayer on the Surface and Crystal Quality of a Semipolar (11–22) GaN Template
  66. Effect of the Bias Voltage on the Polycrystalline a-axis Oriented AlN Thin Films by RF Sputtering
  67. In-situ tuning of Sn doped In2O3 (ITO) films properties by controlling deposition Argon/Oxygen flow
  68. Effects of pulse cycle number on the quality of pulsed atomic-layer epitaxy AlN films grown via metal organic chemical vapor deposition
  69. Surface and optical characteristics of polycrystalline GaN layer with different pores profile of porous GaAs/GaAs substrate
  70. Fabrication of InxGa1-xN/GaN Multi-Quantum well Structure for Green Light Emitting Diode on Patterned Sapphire Substrate by Metal Organic Chemical Vapour Deposition
  71. Improving Material Quality of Polycrystalline GaN by Manipulating the Etching Time of a Porous AlN Template
  72. Ammonia flux tailoring on the quality of AlN epilayers grown by pulsed atomic-layer epitaxy techniques on (0 0 0 1)-oriented sapphire substrates via MOCVD
  73. Enhancing the performance of vanadyl phthalocyanine-based humidity sensor by varying the thickness
  74. Nanosecond pulse generation with a gallium nitride saturable absorber
  75. Metal organic chemical vapor deposition of m-plane GaN epi-layer using a three-step approach towards enhanced surface morphology
  76. Creating Energy-Efficient LEDs
  77. Observation of saturation transfer characteristics in solution processed vertical organic field-effect transistors (VOFETs) with high leakage current
  78. Standard pressure deposition of crack-free AlN buffer layer grown on c-plane sapphire by PALE technique via MOCVD
  79. Effect of thermal interaction between bulk GaN substrates and corral sapphire on blue light emission InGaN/GaN multi-quantum wells by MOCVD
  80. Enhancement of optical transmittance and electrical resistivity of post-annealed ITO thin films RF sputtered on Si
  81. Effect of low NH3 flux towards high quality semi-polar (11-22) GaN on m-plane sapphire via MOCVD
  82. Effect of working power and pressure on plasma properties during the deposition of TiN films in reactive magnetron sputtering plasma measured using Langmuir probe measurement
  83. Thermally Resistive Electrospun Composite Membranes for Low‐Grade Thermal Energy Harvesting
  84. Fabrications of Nanocomposite Gold-Polymer Metamaterials Consisting of Periodic Microcavities with Tunable Optical Properties
  85. Correlation between indium content in monolithic InGaN/GaN multi quantum well structures on photoelectrochemical activity for water splitting
  86. Optimization of poly(vinylidene fluoride) membranes for enhanced power density of thermally driven electrochemical cells
  87. Development of atmospheric pressure plasma needle jet for sterilization applications
  88. Nitrogen emission in reactive magnetron sputtering plasmas during the deposition of titanium nitride thin film
  89. Synthesis and characterization of InN nanocrystals on glass substrate by plasma assisted reactive evaporation
  90. First-principles calculation of structural, optoelectronic properties of the cubic Al Ga In1 N quaternary alloys matching on AlN substrate, within modified Becke–Johnson (mBJ) exchange potential
  91. High figure of merit of the post-annealed Ti/Al/ITO transparent conductive contacts sputter deposited on n-GaN
  92. High Thermal Gradient in Thermo-electrochemical Cells by Insertion of a Poly(Vinylidene Fluoride) Membrane
  93. Effect of nitridation surface treatment on silicon (1 1 1) substrate for the growth of high quality single-crystalline GaN hetero-epitaxy layer by MOCVD
  94. Fabrication of nanostructured Al-doped ZnO thin film for methane sensing applications
  95. Effect of Sn dopant concentration on structural and electrical properties of ZnO nanostructures based methane gas sensor
  96. Effect of Dopant Concentration on Electrical and Optical Properties of Sn-Doped ZnO Thin Films Deposited by Sol-Gel Immersion Method
  97. Effect of Various Tin Doping Percentages on the Electrical and Structural Properties of Nanostructured Zinc Oxide Thin Films Deposited Using Sol-Gel Immersion Method for Gas Sensing Application
  98. Electrical and Structural Properties of Nanostructured Tin Doped Zinc Oxide Deposited by Sol-Gel Immersion Method
  99. Structural Properties of Sn-Doped ZnO Thin Films Deposited on Glass Substrate Using Sol-Gel Immersion Method
  100. Effect of using two-step thermal annealing with different ambient gas on Mg activation and crystalline quality in GaN
  101. Structural ordering, morphology and optical properties of amorphous AlxIn1−xN thin films grown by plasma-assisted dual source reactive evaporation
  102. Investigation of the electrochemical behavior of indium nitride thin films by plasma-assisted reactive evaporation
  103. One-pot sol–gel synthesis of reduced graphene oxide uniformly decorated zinc oxide nanoparticles in starch environment for highly efficient photodegradation of Methylene Blue
  104. Crystalline quality assessment, photocurrent response and optical properties of reduced graphene oxide uniformly decorated zinc oxide nanoparticles based on the graphene oxide concentration
  105. Nanocolumnar zinc oxide as a transparent conductive oxide film for a blue InGaN-based light emitting diode
  106. Improved optoelectronics properties of ITO-based transparent conductive electrodes with the insertion of Ag/Ni under-layer
  107. Effects of graphene oxide concentration on optical properties of ZnO/RGO nanocomposites and their application to photocurrent generation
  108. Plasma-assisted hot filament chemical vapor deposition of AlN thin films on ZnO buffer layer: toward highly c-axis-oriented, uniform, insulative films
  109. Numerical estimation of self-sputtering effect in ionized physical vapor deposition system
  110. Characterization of ITO/Ag and ITO/Ni Bi-Layer Transparent Conductive Electrodes
  111. Synthesis and characterization of ZnO NPs/reduced graphene oxide nanocomposite prepared in gelatin medium as highly efficient photo-degradation of MB
  112. The effect of sputtering pressure on structural, optical and electrical properties of indium tin oxide nanocolumns prepared by radio frequency (RF) magnetron sputtering
  113. Nanostructured Al-doped ZnO-based gas sensor prepared using sol-gel spin-coating method
  114. Effect of annealing on structural, optical, and electrical properties of nickel (Ni)/indium tin oxide (ITO) nanostructures prepared by RF magnetron sputtering
  115. Post-Annealing Effects on ITO Thin Films RF Sputtered at Different Thicknesses on Si and Glass
  116. Effect of Substrate Temperature on Structural and Morphological Properties of Indium Tin Oxide Nanocolumns Using RF Magnetron Sputtering
  117. Effects of Growth Temperature on the Structural Properties of Zinc Oxide Nanograins Deposited by RF Magnetron Sputtering
  118. Structural and Optical Properties of Nickel (Ni)/indium Tin Oxide (ITO) Thin-Films Deposited by RF Magnetron Sputtering
  119. Structural and Optical Properties of Nickel-Doped Zinc Oxide Thin Film on Nickel Seed Layer Deposited by RF Magnetron Sputtering Technique
  120. Modeling and simulation of metal organic halide vapor phase epitaxy (MOHVPE) growth chamber
  121. Structural, optical and electrical characterization of ITO, ITO/Ag and ITO/Ni transparent conductive electrodes
  122. Effect of Annealing on Surface of Nickel (Ni)/Indium Tin Oxide (ITO) Nanostructures Measured by Atomic Force Microscopy (AFM)
  123. Effects of Oxygen Gas Composition on Nanocolumnar Zinc Oxide Properties Deposited by RF Magnetron Sputtering
  124. Effects of Pressure Dependence on Nanocolumnar Zinc Oxide Deposited by RF Magnetron Sputtering
  125. Influence of RF Magnetron Sputtering Pressure on the Structural, Optical, and Morphological Properties of Indium Tin Oxide Nanocolumns
  126. Influence of Substrate Temperature on Morphological and Electrical Properties of Indium Tin Oxide Nanocolumns Prepared by RF Magnetron Sputtering
  127. Study of Annealed Nickel (Ni)/Indium Tin Oxide (ITO) Nanostructures Prepared by RF Magnetron Sputtering
  128. InGaN-based multi-quantum well light-emitting diode structure with the insertion of superlattices under-layer
  129. A Study on the Seebeck Effect of 3,4,9,10-Perylenetetracarboxylic Dianhydride (PTCDA) as a Novel N-Type Material in a Thermoelectric Device
  130. Compositional and Structural Characterization of Heterostructure InGaN-Based Light-Emitting Diode by High Resolution X-Ray Diffraction
  131. Electrical and Optical Characterization of Mg Doping in GaN
  132. Investigation of the Geometry Modeling of Metal Organic Halide Vapor Phase Epitaxy (MOHVPE) Reactor
  133. Electronic properties and electrical characteristics of modified PEDOT:PSS as a buffer layer in organic solar cell
  134. Structural properties of InGaN-based light-emitting diode epitaxial growth on Si (111) with AlN/InGaN buffer layer
  135. PEDOT:PSS Thin Film as Transparent Electrode in ITO-Free Organic Solar Cell
  136. InGaN-based blue LED grown on Si(111) substrate
  137. Effect of AlGaN∕GaN Strained-Layer Superlattices Underlayer to InGaN-based Multi-Quantum Wells Grown on Si(111) Substrate by MOCVD
  138. High performance InGaN LEDs on Si (1 1 1) substrates grown by MOCVD
  139. Effect of Al0.06Ga0.94N/GaN Strained-Layer Superlattices Cladding Underlayer to InGaN-Based Multi-Quantum Well Grown on Si(111) Substrate with AlN/GaN Intermediate Layer
  140. Growth of InGaN-based laser diode structure on silicon (111) substrate